X‐ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

1992 ◽  
Vol 60 (10) ◽  
pp. 1208-1210 ◽  
Author(s):  
K. Uwasawa ◽  
F. Ishihara ◽  
S. Matsumoto
Sign in / Sign up

Export Citation Format

Share Document