Formation mechanism of Ohmic contacts on AlGaN∕GaN heterostructure: Electrical and microstructural characterizations

2008 ◽  
Vol 103 (9) ◽  
pp. 093516 ◽  
Author(s):  
Liang Wang ◽  
Fitih M. Mohammed ◽  
Ilesanmi Adesida
Author(s):  
Joanna Prazmowska ◽  
Wojciech Piotr Macherzynski ◽  
Regina Paszkiewicz

2015 ◽  
Vol 590 ◽  
pp. 335-339 ◽  
Author(s):  
Seonno Yoon ◽  
Jangwon Bang ◽  
Yunwon Song ◽  
Jungwoo Oh

2016 ◽  
Vol 120 (10) ◽  
pp. 104502 ◽  
Author(s):  
A. Constant ◽  
J. Baele ◽  
P. Coppens ◽  
W. Qin ◽  
H. Ziad ◽  
...  

2012 ◽  
Vol 186 ◽  
pp. 82-85 ◽  
Author(s):  
Marek Wzorek ◽  
Andrzej Czerwiński ◽  
Andrian V. Kuchuk ◽  
Jacek Ratajczak ◽  
Ania Piotrowska ◽  
...  

Ni/Si multilayer contact structures to 4H-SiC after subsequent annealing steps are investigated with electron microscopy methods. After high temperature annealing step, specific defects in the contact structures are observed. The influence of phase transformations during annealings on the morphology on the contacts is discussed and the explanation of formation mechanism of voids within contact layer is proposed.


2012 ◽  
Vol 52 (2) ◽  
pp. 434-438 ◽  
Author(s):  
Zhihua Dong ◽  
Jinyan Wang ◽  
C.P. Wen ◽  
Shenghou Liu ◽  
Rumin Gong ◽  
...  

1994 ◽  
Vol 23 (9) ◽  
pp. 983-989 ◽  
Author(s):  
Chihiro J. Uchibori ◽  
Masayuki Okunishi ◽  
T. Oku ◽  
A. Otsuki ◽  
Naoki Ono ◽  
...  

2007 ◽  
Vol 90 (25) ◽  
pp. 252109 ◽  
Author(s):  
Hung-Ta Wang ◽  
T. J. Anderson ◽  
B. S. Kang ◽  
F. Ren ◽  
Changzhi Li ◽  
...  

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