Response to “Comment on ‘Application of the interface capacitance model to thin-film relaxors and ferroelectrics’” [Appl. Phys. Lett. 89, 196101 (2006)]
2011 ◽
Vol 26
(2)
◽
pp. 178-182
2008 ◽
Vol 43
(1)
◽
pp. 43-49
◽