scholarly journals An analytical capacitance model for a hydrogenated amorphous silicon based thin-film transistor

2011 ◽  
Vol 21 ◽  
pp. 122-127 ◽  
Author(s):  
Z. Hafdi
1999 ◽  
Vol 558 ◽  
Author(s):  
J.Y. Nahm ◽  
J.H. Lan ◽  
J. Kanicki

ABSTRACTA high-voltage hydrogenated amorphous silicon thin film transistor (H-V a-Si:H TFT) with thick double layer gate insulator (∼0.95 μm) has been developed for reflective active-matrix cholesteric liquid crystal displays. The double layer gate insulator consists of 0.85 and 0.10 μm thick benzocyclobutene and hydrogenated amorphous silicon nitride, respectively. This HV a-Si:H TFT operates at the gate-tosource and drain-to-source biases up to 100V without any serious leakage current degradation and device breakdown.


2004 ◽  
Vol 25 (3) ◽  
pp. 132-134 ◽  
Author(s):  
S.H. Won ◽  
J.H. Hur ◽  
C.B. Lee ◽  
H.C. Nam ◽  
J.K. Chung ◽  
...  

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