Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate

Roman Antos; Jaromir Pistora; Ivan Ohlidal; Kamil Postava; Jan Mistrik; Tomuo Yamaguchi; Stefan Visnovsky; Masahiro Horie

doi:10.1063/1.1854728

Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate

Journal of Applied Physics ◽

10.1063/1.1854728 ◽

2005 ◽

Vol 97 (5) ◽

pp. 053107 ◽

Cited By ~ 13

Author(s):

Roman Antos ◽

Jaromir Pistora ◽

Ivan Ohlidal ◽

Kamil Postava ◽

Jan Mistrik ◽

...

Keyword(s):

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Transparent Plate

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Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828–836]

Thin Solid Films ◽

10.1016/j.tsf.2004.05.001 ◽

2004 ◽

Vol 468 (1-2) ◽

pp. 338

Keyword(s):

Real Time ◽

Process Monitoring ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Time Process ◽

Thin Solid Films ◽

Solid Films ◽

Dimension Measurement

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Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

Thin Solid Films ◽

10.1016/j.tsf.2004.04.010 ◽

2004 ◽

Vol 455-456 ◽

pp. 828-836 ◽

Cited By ~ 77

Author(s):

Hsu-Ting Huang ◽

Fred L. Terry Jr

Keyword(s):

Real Time ◽

Process Monitoring ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Time Process ◽

Dimension Measurement

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Roughness Analysis of the Critical Dimension by Using Spectroscopic Ellipsometry

Journal of the Korean Physical Society ◽

10.3938/jkps.58.1426 ◽

2011 ◽

Vol 58 (5(1)) ◽

pp. 1426-1428 ◽

Cited By ~ 1

Author(s):

T. H. Ghong ◽

S.-H. Han ◽

J.-M. Chung ◽

J. S. Byun ◽

Y. D. Kim ◽

...

Keyword(s):

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Roughness Analysis

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Method for Extracting Ge Concentration of SiGe Channel FinFET Device Using Three-Dimensional Spectroscopic Ellipsometry-Optical Critical Dimension Metrology

ECS Solid State Letters ◽

10.1149/2.0031409ssl ◽

2014 ◽

Vol 3 (9) ◽

pp. P105-P107

Author(s):

C.-H. Chen ◽

Y.-C. Fang ◽

C.-H. Chiang ◽

S.-Y. Chu

Keyword(s):

Spectroscopic Ellipsometry ◽

Three Dimensional ◽

Critical Dimension

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Nanoscale optical critical dimension measurement of a contact hole using deep ultraviolet spectroscopic ellipsometry

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4771969 ◽

2013 ◽

Vol 31 (1) ◽

pp. 011803 ◽

Cited By ~ 5

Author(s):

Houssam Chouaib ◽

Qiang Zhao

Keyword(s):

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Dimension Measurement ◽

Deep Ultraviolet

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Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.14.3.031208 ◽

2015 ◽

Vol 14 (3) ◽

pp. 031208 ◽

Cited By ~ 11

Author(s):

Dhairya Dixit ◽

Samuel O’Mullane ◽

Sravan Sunkoju ◽

Abhishek Gottipati ◽

Erik R. Hosler ◽

...

Keyword(s):

Sensitivity Analysis ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Edge Roughness ◽

28 Nm

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Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3507888 ◽

2010 ◽

Vol 28 (6) ◽

pp. C6M130-C6M135 ◽

Cited By ~ 1

Author(s):

Zhaoning Yu ◽

Justin Hwu ◽

Yongdong Liu ◽

Zhenpeng Su ◽

Henry Yang ◽

...

Keyword(s):

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Magnetic Media ◽

Media Applications

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Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828–836]

Thin Solid Films ◽

10.1016/j.tsf.2004.06.099 ◽

2004 ◽

Vol 468 (1-2) ◽

pp. 339-346 ◽

Cited By ~ 31

Author(s):

Hsu-Ting Huang ◽

Fred L. Terry Jr

Keyword(s):

Real Time ◽

Process Monitoring ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Time Process ◽

Thin Solid Films ◽

Solid Films ◽

Dimension Measurement

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Normal-incidence spectroscopic ellipsometry and polarized reflectometry for measurement and control of photoresist critical dimension

10.1117/12.473439 ◽

2002 ◽

Cited By ~ 8

Author(s):

James M. Holden ◽

Thomas Gubiotti ◽

William A. McGahan ◽

Mircea V. Dusa ◽

Ton Kiers

Keyword(s):

Spectroscopic Ellipsometry ◽

Normal Incidence ◽

Critical Dimension ◽

And Control ◽

Measurement And Control

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Analysis of surface roughness of critical-dimension structures using spectroscopic ellipsometry

10.1063/1.3666489 ◽

2011 ◽

Author(s):

T. H. Ghong ◽

S.-H. Han ◽

J.-M. Chung ◽

J. S. Byun ◽

D. E. Aspnes ◽

...

Keyword(s):

Surface Roughness ◽

Spectroscopic Ellipsometry ◽

Critical Dimension

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