Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

2010 ◽  
Vol 28 (6) ◽  
pp. C6M130-C6M135 ◽  
Author(s):  
Zhaoning Yu ◽  
Justin Hwu ◽  
Yongdong Liu ◽  
Zhenpeng Su ◽  
Henry Yang ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Critical Dimension ◽  
Magnetic Media ◽  
Media Applications

Functionalization of Nanomaterials utilizing Pulse Thermal Processing

2004 ◽  
Vol 853 ◽  
Author(s):  
Puja B. Kadolkar ◽  
Ronald D. Ott ◽  
Craig A. Blue ◽  
Adrian S. Sabau
Keyword(s):  
Thermal Processing ◽  
Thin Film Transistor ◽  
Single Pulse ◽  
Time Frame ◽  
High Density ◽  
Plasma Arc ◽  
Magnetic Media ◽  
Heating Rates ◽  
Wide Range ◽  
Media Applications

ABSTRACTPulse Thermal Processing (PTP) using a High Density Infrared (HDI) Plasma Arc Lamp has been investigated as an enabling manufacturing tool for processing nanomaterials and thin-films. HDI is a single source lamp that offers unique capabilities of processing broad areas with power densities approaching those of a laser. The extremely high radiant energies delivered by the plasma arc lamp provides heating rates approaching 600, 000°C/s through a single pulse on a millisecond time frame, thus allowing controlled diffusion on nano-meter scale. The ability to design the functionality of nanomaterials offers tremendous potential to exploit this technology for a wide range of applications based on nanotechnology. This present article discusses application of PTP using high-density plasma arc lamp to perform; a) phase transformation in FePt nanoparticle system for magnetic media applications, and b) crystallization of amorphous Si (a-Si) for photovoltaic and thin-film transistor (TFT) applications.

Roughness Analysis of the Critical Dimension by Using Spectroscopic Ellipsometry

2011 ◽  
Vol 58 (5(1)) ◽  
pp. 1426-1428 ◽  
Author(s):  
T. H. Ghong ◽  
S.-H. Han ◽  
J.-M. Chung ◽  
J. S. Byun ◽  
Y. D. Kim ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Critical Dimension ◽  
Roughness Analysis

Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate

2005 ◽  
Vol 97 (5) ◽  
pp. 053107 ◽  
Author(s):  
Roman Antos ◽  
Jaromir Pistora ◽  
Ivan Ohlidal ◽  
Kamil Postava ◽  
Jan Mistrik ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Critical Dimension ◽  
Transparent Plate
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