Ion energy distribution and optical measurements in high-density, inductively coupled C4F6 discharges

2003 ◽  
Vol 94 (3) ◽  
pp. 1382-1389 ◽  
Author(s):  
Eric C. Benck ◽  
Amanda Goyette ◽  
Yicheng Wang
Keyword(s):  
Energy Distribution ◽  
High Density ◽  
Optical Measurements ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled

scholarly journals Ion Energy Distribution during Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma.

Shinku ◽  
1998 ◽  
Vol 41 (3) ◽  
pp. 147-150 ◽  
Author(s):  
Masamichi MATSUURA ◽  
Tadashi YAMAMOTO ◽  
Tadashi MORITA ◽  
Toshiharu KURAUCHI
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled

Ion energy distribution change at the transition of power-coupling modes in an immersed-coil-type inductively coupled Ar discharge

2004 ◽  
Vol 84 (17) ◽  
pp. 3283-3285 ◽  
Author(s):  
Dae-Hwan Kang ◽  
Dong-Kak Lee ◽  
Ki-Bum Kim ◽  
Jung-Joong Lee ◽  
Junghoon Joo
Keyword(s):  
Energy Distribution ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Power Coupling ◽  
Distribution Change

scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distribution on dc Self Bias of the rf Inductive Coil in Inductively-coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 409-412
Author(s):  
Takayoshi SAITOH ◽  
Suguru SAIKI ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Self Bias
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