scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distribution on dc Self Bias of the rf Inductive Coil in Inductively-coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 409-412
Author(s):  
Takayoshi SAITOH ◽  
Suguru SAIKI ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Self Bias

scholarly journals Ion Energy Distribution during Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma.

Shinku ◽  
1998 ◽  
Vol 41 (3) ◽  
pp. 147-150 ◽  
Author(s):  
Masamichi MATSUURA ◽  
Tadashi YAMAMOTO ◽  
Tadashi MORITA ◽  
Toshiharu KURAUCHI
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled
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