Model etch profiles for ion energy distribution functions in an inductively coupled plasma reactor
1999 ◽
Vol 17
(5)
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pp. 2061
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1998 ◽
Vol 16
(6)
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pp. 3389-3395
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1997 ◽
1995 ◽
Vol 4
(4)
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pp. 541-550
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1993 ◽
Vol 32
(Part 1, No. 10)
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pp. 4756-4760
2005 ◽
Vol 200
(1-4)
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pp. 835-840
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2015 ◽
Vol 33
(6)
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pp. 061301
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