Model etch profiles for argon and chlorine ion energy distribution functions in inductively coupled discharge plasmas

Author(s):  
W. Chen ◽  
B. Abraham-Shrauner ◽  
J.R. Woodworth
1993 ◽  
Vol 32 (Part 1, No. 10) ◽  
pp. 4756-4760
Author(s):  
Yoshifumi Saitou ◽  
Yoshiharu Nakamura ◽  
Masayoshi Tanaka ◽  
Akio Komori ◽  
Yoshinobu Kawai

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