Effect of inductively coupled plasma oxidation on properties of magnetic tunnel junctions

Ohsung Song; Y. M. Lee; C. S. Yoon; C. K. Kim

doi:10.1063/1.1529095

Effect of inductively coupled plasma oxidation on properties of magnetic tunnel junctions

Journal of Applied Physics ◽

10.1063/1.1529095 ◽

2003 ◽

Vol 93 (2) ◽

pp. 1146-1149 ◽

Cited By ~ 4

Author(s):

Ohsung Song ◽

Y. M. Lee ◽

C. S. Yoon ◽

C. K. Kim

Keyword(s):

Inductively Coupled Plasma ◽

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Plasma Oxidation ◽

Inductively Coupled

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Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method

Applied Physics Letters ◽

10.1063/1.1391407 ◽

2001 ◽

Vol 79 (8) ◽

pp. 1160-1162 ◽

Cited By ~ 20

Author(s):

K. S. Yoon ◽

J. H. Park ◽

J. H. Choi ◽

J. Y. Yang ◽

C. H. Lee ◽

...

Keyword(s):

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Rf Plasma ◽

Plasma Oxidation ◽

Oxidation Method

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Effects of inductively coupled plasma oxidation on the properties of polycrystalline silicon films and thin film transistors

Applied Physics Letters ◽

10.1063/1.123939 ◽

1999 ◽

Vol 74 (18) ◽

pp. 2693-2695 ◽

Cited By ~ 15

Author(s):

Yong Woo Choi ◽

Sang Won Park ◽

Byung Tae Ahn

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Inductively Coupled Plasma ◽

Polycrystalline Silicon ◽

Silicon Films ◽

Plasma Oxidation ◽

Inductively Coupled ◽

Polycrystalline Silicon Films

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Surface plasmon resonance measurement of AlOx insulating barriers in magnetic tunnel junctions formed by remote rf plasma oxidation process

Journal of Applied Physics ◽

10.1063/1.1498957 ◽

2002 ◽

Vol 92 (6) ◽

pp. 3283-3286 ◽

Cited By ~ 6

Author(s):

J. H. Park ◽

K. S. Yoon ◽

J. Y. Yang ◽

E. K. Kim ◽

C. H. Lee ◽

...

Keyword(s):

Surface Plasmon Resonance ◽

Surface Plasmon ◽

Plasmon Resonance ◽

Oxidation Process ◽

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Rf Plasma ◽

Plasma Oxidation ◽

Resonance Measurement

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Low-resistance magnetic tunnel junctions prepared by partial remote plasma oxidation of 0.9nm Al barriers

Applied Physics Letters ◽

10.1063/1.1925318 ◽

2005 ◽

Vol 86 (19) ◽

pp. 192502 ◽

Cited By ~ 10

Author(s):

Ricardo Ferreira ◽

Paulo P. Freitas ◽

Maureen MacKenzie ◽

John N. Chapman

Keyword(s):

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Plasma Oxidation ◽

Remote Plasma ◽

Low Resistance ◽

Remote Plasma Oxidation

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The effect of discharge conditions on the inductively coupled plasma oxidation of silicon

Vacuum ◽

10.1016/0042-207x(88)90434-4 ◽

1988 ◽

Vol 38 (8-10) ◽

pp. 643-646 ◽

Cited By ~ 4

Author(s):

S. Taylor ◽

G. Kennedy ◽

W. Eccleston

Keyword(s):

Inductively Coupled Plasma ◽

Plasma Oxidation ◽

Inductively Coupled

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Real-time monitoring of plasma oxidation dynamics of subnanometer Al2O3 barriers for magnetic tunnel junctions

Applied Physics Letters ◽

10.1063/1.2166696 ◽

2006 ◽

Vol 88 (3) ◽

pp. 031909 ◽

Cited By ~ 1

Author(s):

C. G. C. H. M. Fabrie ◽

K. Knechten ◽

J. T. Kohlhepp ◽

H. J. M. Swagten ◽

B. Koopmans ◽

...

Keyword(s):

Real Time ◽

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Plasma Oxidation ◽

Real Time Monitoring

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Enhanced performance of CoFe/AlO[sub x]/CoFe magnetic tunnel junctions prepared by an off-axis rf remote plasma oxidation method

Journal of Applied Physics ◽

10.1063/1.1452647 ◽

2002 ◽

Vol 91 (10) ◽

pp. 7953 ◽

Cited By ~ 8

Author(s):

K. S. Yoon ◽

J. H. Park ◽

J. Y. Yang ◽

C. O. Kim ◽

J. P. Hong

Keyword(s):

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Plasma Oxidation ◽

Remote Plasma ◽

Oxidation Method ◽

Remote Plasma Oxidation

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Effect of Plasma Oxidation on Pre-Oxidized Magnetic Tunnel Junctions

IEEE Transactions on Magnetics ◽

10.1109/tmag.2008.2001329 ◽

2008 ◽

Vol 44 (11) ◽

pp. 2911-2913 ◽

Cited By ~ 1

Author(s):

P.W.T. Pong ◽

M. Schmoueli ◽

W.F. Egelhoff

Keyword(s):

Tunnel Junctions ◽

Magnetic Tunnel Junctions ◽

Plasma Oxidation

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Growth characteristics of micro-plasma oxidation ceramic coatings on Ti alloy by inductively coupled plasma-atomic emission spectrometer technique

Applied Surface Science ◽

10.1016/j.apsusc.2006.09.027 ◽

2007 ◽

Vol 253 (9) ◽

pp. 4267-4272 ◽

Cited By ~ 8

Author(s):

Zhongping Yao ◽

Zhaohua Jiang ◽

Fuping Wang ◽

Wei Xue

Keyword(s):

Inductively Coupled Plasma ◽

Atomic Emission ◽

Ceramic Coatings ◽

Growth Characteristics ◽

Ti Alloy ◽

Plasma Oxidation ◽

Plasma Atomic Emission ◽

Inductively Coupled ◽

Atomic Emission Spectrometer

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Low-Temperature Growth of N-doped SiO2Layer Using Inductively-Coupled Plasma Oxidation and Its Effect on the Characteristics of Thin Film Transistors

Korean Journal of Materials Research ◽

10.3740/mrsk.2009.19.1.037 ◽

2009 ◽

Vol 19 (1) ◽

pp. 37-43 ◽

Cited By ~ 1

Author(s):

Bo-Hyun Kim ◽

Seung-Ryul Lee ◽

Kyung-Min Ahn ◽

Seung-Mo Kang ◽

Yong-Ho Yang ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Thin Film Transistors ◽

Inductively Coupled Plasma ◽

Plasma Oxidation ◽

Temperature Growth ◽

Low Temperature Growth ◽

Inductively Coupled

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