Characterization of silicon dioxide film by high spatial resolution cathodoluminescence spectroscopy

2002 ◽  
Vol 92 (12) ◽  
pp. 7153-7156 ◽  
Author(s):  
M. Yoshikawa ◽  
K. Matsuda ◽  
Y. Yamaguchi ◽  
T. Matsunobe ◽  
Y. Nagasawa ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Silicon Dioxide Film ◽  
Cathodoluminescence Spectroscopy ◽  
Dioxide Film

Characterization of V-Defects in InGaN Single-Quantum-Well Films at Nanometer Level by High Spatial Resolution Cathodoluminescence Spectroscopy

2008 ◽  
Vol 600-603 ◽  
pp. 1305-1308
Author(s):  
Masanobu Yoshikawa ◽  
Masataka Murakami ◽  
Takaya Fujita ◽  
K. Inoue ◽  
K. Matsuda ◽  
...  
Keyword(s):  
Quantum Well ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Spectral Variation ◽  
Single Quantum ◽  
Single Quantum Well ◽  
Cathodoluminescence Spectroscopy

We have measured cathodoluminescence (CL) spectra in the vicinity of V-defects in InGaN single-quantum-well(SQW) films at nanometer level, using newly developed CL apparatus (SE-SEM-CL). From spectroscopic CL measurement, it has been found that the spectra change dramatically in the vicinity of V-defects in the region of £50nm. The SE-SEM-CL has a potential to detect the CL spectral variation at spatial resolution with £50nm.

Characterization of fluorine-doped silicon dioxide film by Raman spectroscopy

1997 ◽  
Vol 310 (1-2) ◽  
pp. 167-170 ◽  
Author(s):  
M. Yoshikawa ◽  
K. Iwagami ◽  
N. Morita ◽  
T. Matsunobe ◽  
H. Ishida
Keyword(s):  
Raman Spectroscopy ◽  
Silicon Dioxide ◽  
Silicon Dioxide Film ◽  
Doped Silicon ◽  
Dioxide Film

Preparation and characterization of hydrophilic silicon dioxide film on acrylate polyurethane coatings with self-cleaning ability

2015 ◽  
Vol 349 ◽  
pp. 916-923 ◽  
Author(s):  
Xin Yang ◽  
Liqun Zhu ◽  
Yichi Chen ◽  
Baiqing Bao ◽  
Jinlong Xu ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Silicon Dioxide Film ◽  
Polyurethane Coatings ◽  
Self Cleaning ◽  
Dioxide Film

Characterization and Control of Copper CMP with Optoacoustic Metrology

2001 ◽  
Vol 671 ◽  
Author(s):  
Michael Gostein ◽  
Paul Lefevre ◽  
Alex A. Maznev ◽  
Michael Joffe
Keyword(s):  
Film Thickness ◽  
Spatial Resolution ◽  
Chemical Mechanical Polishing ◽  
High Spatial Resolution ◽  
Mechanical Polishing ◽  
Length Measurement ◽  
And Control ◽  
Non Destructive

ABSTRACTWe discuss applications of optoacoustic film thickness metrology for characterization of copper chemical-mechanical polishing (CMP). We highlight areas where the use of optoacoustics for CMP characterization provides data complementary to that obtained by other techniques because of its ability to directly measure film thickness with high spatial resolution in a rapid, non-destructive manner. Examples considered include determination of planarization length, measurement of film thickness at intermediate stages of polish, and measurement of arrays of metal lines.

Low-energy mass-selected ion beam production of fragments from tetraethylorthosilicate for the formation of silicon dioxide film

2018 ◽  
Vol 655 ◽  
pp. 22-26 ◽  
Author(s):  
Satoru Yoshimura ◽  
Satoshi Sugimoto ◽  
Takae Takeuchi ◽  
Kensuke Murai ◽  
Masato Kiuchi
Keyword(s):  
Silicon Dioxide ◽  
Ion Beam ◽  
Low Energy ◽  
Silicon Dioxide Film ◽  
Beam Production ◽  
Dioxide Film
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