Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition

Y. J. Song; W. A. Anderson

doi:10.1063/1.122954

Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.122954 ◽

1999 ◽

Vol 74 (1) ◽

pp. 67-69 ◽

Cited By ~ 2

Author(s):

Y. J. Song ◽

W. A. Anderson

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Cited By ~ 41

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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High second-order nonlinearity by p-n junction formation in plasma enhanced chemical vapor deposition deposited hydrogenated amorphous silicon thin films

Applied Physics Letters ◽

10.1063/1.4907643 ◽

2015 ◽

Vol 106 (6) ◽

pp. 061905 ◽

Cited By ~ 1

Author(s):

Qiming Liu ◽

Guoxing Wu ◽

Mingliang Wang ◽

Xiujian Zhao ◽

Jincheng Du

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Junction Formation ◽

Hydrogenated Amorphous ◽

Second Order Nonlinearity

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RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effects of microwave power on the structural and emission properties of hydrogenated amorphous silicon carbide deposited by electron cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1344218 ◽

2001 ◽

Vol 89 (5) ◽

pp. 2699-2705 ◽

Cited By ~ 21

Author(s):

J. Cui ◽

Rusli ◽

S. F. Yoon ◽

M. B. Yu ◽

K. Chew ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Microwave Power ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogenated Amorphous

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Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers

Thin Solid Films ◽

10.1016/j.tsf.2019.137534 ◽

2019 ◽

Vol 690 ◽

pp. 137534 ◽

Cited By ~ 1

Author(s):

Hugo da S. Alvarez ◽

Audrey R. Silva ◽

Frederico H. Cioldin ◽

Luana C.J. Espindola ◽

José A. Diniz

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogenated Amorphous

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Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.4946 ◽

1993 ◽

Vol 32 (Part 1, No. 11A) ◽

pp. 4946-4947 ◽

Cited By ~ 8

Author(s):

Tatsuru Shirafuji ◽

Wei-ming Chen ◽

Mikio Yamamuka ◽

Kunihide Tachibana

Keyword(s):

Thin Films ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Spectroscopic ellipsometry studies on hydrogenated amorphous silicon thin films deposited using DC saddle field plasma enhanced chemical vapor deposition system

Thin Solid Films ◽

10.1016/j.tsf.2010.12.074 ◽

2011 ◽

Vol 519 (9) ◽

pp. 2863-2866 ◽

Cited By ~ 9

Author(s):

Jhantu Kumar Saha ◽

Barzin Bahardoust ◽

Keith Leong ◽

Adel B. Gougam ◽

Nazir P. Kherani ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Dc Saddle Field ◽

Hydrogenated Amorphous

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Dominant monohydride bonding in hydrogenated amorphous silicon thin films formed by plasma enhanced chemical vapor deposition at room temperature

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580480 ◽

1997 ◽

Vol 15 (1) ◽

pp. 77-84 ◽

Cited By ~ 37

Author(s):

Easwar Srinivasan ◽

Daniel A. Lloyd ◽

Gregory N. Parsons

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Room Temperature ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition

Proceedings of the 2015 4th International Conference on Sustainable Energy and Environmental Engineering ◽

10.2991/icseee-15.2016.129 ◽

2016 ◽

Author(s):

Shiguo Yang ◽

Guozhi Wen ◽

Yang Luo ◽

Yi Liang

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Deposition and 1.54 μm Er3+ luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH4 with concurrent sputtering of erbium

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582047 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3230-3234 ◽

Cited By ~ 7

Author(s):

Jung H. Shin ◽

Mun-Jun Kim

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Luminescent Properties ◽

Silicon Thin Films ◽

Erbium Doped ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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