RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

1998 ◽  
Author(s):  
Yoshiyuki Hirano ◽  
Fumio Sato ◽  
Ahalapitiya H. Jayatissa ◽  
Hiroshi Ohtake ◽  
Kuniharu Takizawa
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