RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition
Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon
1995 ◽
Vol 34
(Part 1, No. 11)
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pp. 5965-5970
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2003 ◽
Vol 332
(1-3)
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pp. 53-59
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2002 ◽
Vol 235
(1-4)
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pp. 333-339
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1996 ◽
Vol 14
(3)
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pp. 1687
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