Asymmetric microtrenching during inductively coupled plasma oxide etching in the presence of a weak magnetic field

1998 ◽  
Vol 72 (11) ◽  
pp. 1293-1295 ◽  
Author(s):  
Marc Schaepkens ◽  
Gottlieb S. Oehrlein
Keyword(s):  
Magnetic Field ◽  
Inductively Coupled Plasma ◽  
Weak Magnetic Field ◽  
Inductively Coupled ◽  
Oxide Etching

scholarly journals Effects of axial magnetic field on discharge characteristics of inductively coupled plasma

AIP Advances ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 055209
Author(s):  
Shengwu Zhang ◽  
Yiwen Li ◽  
Wang Ma ◽  
Xiaolong Wei ◽  
Wenyuan Zhang
Keyword(s):  
Magnetic Field ◽  
Inductively Coupled Plasma ◽  
Axial Magnetic Field ◽  
Discharge Characteristics ◽  
Inductively Coupled

Capacitively and Inductively Coupled Plasma for MEMS Applications

Volume 3 ◽  
2004 ◽  
Author(s):  
Jaime H. Lozano-Parada ◽  
William B. J. Zimmerman
Keyword(s):  
Magnetic Field ◽  
Electromagnetic Fields ◽  
Inductively Coupled Plasma ◽  
Flow Direction ◽  
Axial Pressure ◽  
Inductively Coupled ◽  
Laser Lithography ◽  
First Case ◽  
Lorentz Forces ◽  
Electric And Magnetic Field

We consider the development of capacitively and inductively coupled microplasma reactors for detection, control and chemical transformation in microelectromechanical (mems) applications. Current progress in fabrication techniques, including hot embossing, soft and laser lithography is reviewed. Numerical simulations of the interaction of electromagnetic fields with plasma flows in which the plasma flow is at right angles with the electric and magnetic field are analyzed. Two cases in which the electromagnetic fields induce lorentz forces that control the flow are presented. In the first case, the lorentz forces act along the flow direction and produce and increase in the axial pressure that accelerates the flow (micropump configuration). In the second case, the lorentz forces act against the flow by causing a drop in the axial pressure that slows down the flow (microbrake configuration).

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