Fluorocarbon Polymer Deposited by Inductively Coupled Plasma Oxide Etching

Tohru Hara; Masayuki Sato; Keizo Sakiyama

doi:10.1149/1.1838418

Fluorocarbon Polymer Deposited by Inductively Coupled Plasma Oxide Etching

Journal of The Electrochemical Society ◽

10.1149/1.1838418 ◽

1998 ◽

Vol 145 (4) ◽

pp. L67-L70 ◽

Cited By ~ 2

Author(s):

Tohru Hara ◽

Masayuki Sato ◽

Keizo Sakiyama

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Oxide Etching ◽

Fluorocarbon Polymer

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Direct multi-element analysis of a fluorocarbon polymer via solid sampling-electrothermal vaporization-inductively coupled plasma mass spectrometry

Journal of Analytical Atomic Spectrometry ◽

10.1039/b602606k ◽

2006 ◽

Vol 21 (9) ◽

pp. 891-898 ◽

Cited By ~ 28

Author(s):

M. Resano ◽

M. Aramendía ◽

W. Devos ◽

F. Vanhaecke

Keyword(s):

Mass Spectrometry ◽

Inductively Coupled Plasma ◽

Solid Sampling ◽

Electrothermal Vaporization ◽

Element Analysis ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Fluorocarbon Polymer ◽

Multi Element Analysis

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Influences of reaction products on etch rates and linewidths in a poly-Si/oxide etching process using HBr/O[sub 2] based inductively coupled plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1511216 ◽

2002 ◽

Vol 20 (5) ◽

pp. 2120 ◽

Cited By ~ 10

Author(s):

K. Miwa ◽

T. Mukai

Keyword(s):

Inductively Coupled Plasma ◽

Etching Process ◽

Reaction Products ◽

Inductively Coupled ◽

Oxide Etching ◽

Etch Rates

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A study on the characteristics of inductively coupled plasma using multidipole magnets and its application to oxide etching

Thin Solid Films ◽

10.1016/s0040-6090(98)01535-1 ◽

1999 ◽

Vol 341 (1-2) ◽

pp. 176-179 ◽

Cited By ~ 5

Author(s):

K.J An ◽

H.S Kim ◽

J.B Yoo ◽

G.Y Yeom

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Oxide Etching

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Asymmetric microtrenching during inductively coupled plasma oxide etching in the presence of a weak magnetic field

Applied Physics Letters ◽

10.1063/1.121068 ◽

1998 ◽

Vol 72 (11) ◽

pp. 1293-1295 ◽

Cited By ~ 64

Author(s):

Marc Schaepkens ◽

Gottlieb S. Oehrlein

Keyword(s):

Magnetic Field ◽

Inductively Coupled Plasma ◽

Weak Magnetic Field ◽

Inductively Coupled ◽

Oxide Etching

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Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1286396 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2122 ◽

Cited By ~ 41

Author(s):

M. J. Sowa ◽

M. E. Littau ◽

V. Pohray ◽

J. L. Cecchi

Keyword(s):

Inductively Coupled Plasma ◽

Plasma Reactor ◽

Low Pressure ◽

High Density ◽

Deposition Kinetics ◽

Inductively Coupled ◽

Inductively Coupled Plasma Reactor ◽

Fluorocarbon Polymer ◽

Polymer Deposition

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Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581169 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1459-1463 ◽

Cited By ~ 4

Author(s):

M. J. Lercel ◽

D. Dang ◽

N. Marmillion ◽

W. Mlynko

Keyword(s):

Inductively Coupled Plasma ◽

Plasma Etch ◽

Inductively Coupled ◽

Oxide Etching

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Effects of magnetic field on oxide etching characteristics in planar type radio frequency inductively coupled plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580122 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1007-1010 ◽

Cited By ~ 15

Author(s):

Ho‐Jun Lee ◽

Jung‐Hun Kim ◽

Ki‐Woong Whang ◽

Jung‐Hoon Joo

Keyword(s):

Magnetic Field ◽

Radio Frequency ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Oxide Etching

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Determination of Ultra-Trace Scandium, Yttrium and Rare-Earth Elements in High-Purity Iron by High-Resolution Inductively Coupled Plasma-Mass Spectrometry

Matériaux & Techniques ◽

10.1051/mattech/200391120031s ◽

2003 ◽

Vol 91 ◽

pp. 31-36 ◽

Cited By ~ 2

Author(s):

Tetsuya Ashino ◽

Kunio Takada ◽

Kazuaki Wagatsuma ◽

Kenji Abiko

Keyword(s):

Mass Spectrometry ◽

Rare Earth ◽

High Resolution ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Purity Iron ◽

High Purity Iron ◽

Ultra Trace

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Potential novel diagnostic applications of laser ablation inductively coupled plasma mass spectrometry in trace metal imaging of hepatic metal disorders

Zeitschrift für Gastroenterologie ◽

10.1055/s-0033-1360941 ◽

2014 ◽

Vol 52 (01) ◽

Author(s):

R Weiskirchen ◽

R Uerlings ◽

A Zimmermann ◽

JS Becker

Keyword(s):

Mass Spectrometry ◽

Laser Ablation ◽

Trace Metal ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Diagnostic Applications

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Quantification of hepatic liver iron overload with laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS)

10.1055/s-0038-1677110 ◽

2019 ◽

Author(s):

R Weiskirchen ◽

P Kim ◽

S Weiskirchen ◽

R Uerlings ◽

A Kueppers ◽

...

Keyword(s):

Mass Spectrometry ◽

Laser Ablation ◽

Iron Overload ◽

Inductively Coupled Plasma ◽

Liver Iron ◽

Inductively Coupled ◽

Icp Ms ◽

Liver Iron Overload ◽

Plasma Mass Spectrometry

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