scholarly journals Azimuthally symmetric pseudosurface and helicon wave propagation in an inductively coupled plasma at low magnetic field

1998 ◽  
Vol 5 (9) ◽  
pp. 3135-3142 ◽  
Author(s):  
T. Lho ◽  
N. Hershkowitz ◽  
J. Miller ◽  
W. Steer ◽  
G. H. Kim
Keyword(s):  
Magnetic Field ◽  
Wave Propagation ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Helicon Wave ◽  
Low Magnetic Field

scholarly journals Effects of axial magnetic field on discharge characteristics of inductively coupled plasma

AIP Advances ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 055209
Author(s):  
Shengwu Zhang ◽  
Yiwen Li ◽  
Wang Ma ◽  
Xiaolong Wei ◽  
Wenyuan Zhang
Keyword(s):  
Magnetic Field ◽  
Inductively Coupled Plasma ◽  
Axial Magnetic Field ◽  
Discharge Characteristics ◽  
Inductively Coupled

Capacitively and Inductively Coupled Plasma for MEMS Applications

Volume 3 ◽  
2004 ◽  
Author(s):  
Jaime H. Lozano-Parada ◽  
William B. J. Zimmerman
Keyword(s):  
Magnetic Field ◽  
Electromagnetic Fields ◽  
Inductively Coupled Plasma ◽  
Flow Direction ◽  
Axial Pressure ◽  
Inductively Coupled ◽  
Laser Lithography ◽  
First Case ◽  
Lorentz Forces ◽  
Electric And Magnetic Field

We consider the development of capacitively and inductively coupled microplasma reactors for detection, control and chemical transformation in microelectromechanical (mems) applications. Current progress in fabrication techniques, including hot embossing, soft and laser lithography is reviewed. Numerical simulations of the interaction of electromagnetic fields with plasma flows in which the plasma flow is at right angles with the electric and magnetic field are analyzed. Two cases in which the electromagnetic fields induce lorentz forces that control the flow are presented. In the first case, the lorentz forces act along the flow direction and produce and increase in the axial pressure that accelerates the flow (micropump configuration). In the second case, the lorentz forces act against the flow by causing a drop in the axial pressure that slows down the flow (microbrake configuration).

scholarly journals Helicon Wave Measurements in an Inductively Coupled Magnetoplasma

1995 ◽  
Vol 48 (3) ◽  
pp. 461 ◽  
Author(s):  
Keiji Nakamura ◽  
Keiji Suzuki ◽  
Hideo Sugai
Keyword(s):  
Magnetic Field ◽  
Small Amplitude ◽  
Rf Plasma ◽  
Rf Power ◽  
Radial Magnetic Field ◽  
Inductively Coupled ◽  
Wave Measurements ◽  
Helicon Wave ◽  
Absolute Measurements ◽  
Helicon Waves

Small-amplitude test waves at 30-100 MHz are externally excited in an inductive rf plasma for a magnetic field of rv100 G, to obtain a full dispersion relation for helicon waves. Measured wavelengths agree well with theoretical ones, not only for the test waves but also for largeamplitude principal waves at the discharge frequency of 13�56 MHz. Absolute measurements of the radial magnetic field B; of the large-amplitude helicon wave are carried out, and the r, q and z components of the wave electric field are estimated to be E; rv Eo rv 8 V cm-1 and Ez rv 0�7Vcm-1 at an rf power of 800 W.

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