Effects of magnetic field on oxide etching characteristics in planar type radio frequency inductively coupled plasma

1996 ◽  
Vol 14 (3) ◽  
pp. 1007-1010 ◽  
Author(s):  
Ho‐Jun Lee ◽  
Jung‐Hun Kim ◽  
Ki‐Woong Whang ◽  
Jung‐Hoon Joo
Keyword(s):  
Magnetic Field ◽  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Oxide Etching

scholarly journals Effects of axial magnetic field on discharge characteristics of inductively coupled plasma

AIP Advances ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 055209
Author(s):  
Shengwu Zhang ◽  
Yiwen Li ◽  
Wang Ma ◽  
Xiaolong Wei ◽  
Wenyuan Zhang
Keyword(s):  
Magnetic Field ◽  
Inductively Coupled Plasma ◽  
Axial Magnetic Field ◽  
Discharge Characteristics ◽  
Inductively Coupled

Comparison of external and internal planar radio frequency antennae for inductively coupled plasma

1997 ◽  
Vol 68 (6) ◽  
pp. 2381-2383 ◽  
Author(s):  
K. Eng ◽  
K. Strohmaier ◽  
R. Palmer ◽  
B. Stoner ◽  
S. Washburn
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled

CVD of hard DLC films in a radio frequency inductively coupled plasma source

2001 ◽  
Vol 390 (1-2) ◽  
pp. 98-103 ◽  
Author(s):  
S.J Yu ◽  
Z.F Ding ◽  
J Xu ◽  
J.L Zhang ◽  
T.C Ma
Keyword(s):  
Radio Frequency ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled
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