Ultra‐low‐temperature growth of high‐integrity gate oxide films by low‐energy ion‐assisted oxidation

1994 ◽  
Vol 64 (17) ◽  
pp. 2223-2225 ◽  
Author(s):  
Y. Kawai ◽  
N. Konishi ◽  
J. Watanabe ◽  
T. Ohmi
Keyword(s):  
Low Temperature ◽  
Oxide Films ◽  
Gate Oxide ◽  
Low Energy ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
High Integrity

Ultra Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation

1995 ◽  
Vol 34 (Part 1, No. 2B) ◽  
pp. 900-902 ◽  
Author(s):  
Jinzo Watanabe ◽  
Yasuaki Kawai ◽  
Nobuhiro Konishi ◽  
Tadahiro Ohmi
Keyword(s):  
Low Temperature ◽  
Oxide Films ◽  
Gate Oxide ◽  
Low Energy ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
High Integrity ◽  
Thin Gate Oxide

Possibility of Low Temperature Growth of YBCO Thin Film by Low Energy Ion Assisted Deposition

1993 ◽  
pp. 1001-1004
Author(s):  
Masao Noma ◽  
Masami Nakasone ◽  
Soichi Ogawa ◽  
Tsutom Yotsuya ◽  
Yoshihiko Suzuki
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Low Energy ◽  
Ybco Thin Film ◽  
Temperature Growth ◽  
Low Temperature Growth

Low temperature growth of epitaxial complex oxide films by an excimer laser MOD process

2004 ◽  
Vol 109 (1-3) ◽  
pp. 131-135 ◽  
Author(s):  
T Tsuchiya ◽  
I Yamaguchi ◽  
T Manabe ◽  
T Kumagai ◽  
S Mizuta
Keyword(s):  
Low Temperature ◽  
Excimer Laser ◽  
Oxide Films ◽  
Complex Oxide ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Complex Oxide Films
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