Gallium arsenide antireflection layer via direct wet thermal oxidation

2015 ◽  
Vol 51 (7) ◽  
pp. 575-577 ◽  
Author(s):  
J. Li ◽  
Y. Tian ◽  
D.C. Hall
1990 ◽  
Vol 57 (16) ◽  
pp. 1681-1683 ◽  
Author(s):  
D. K. Sadana ◽  
J. P. de Souza ◽  
F. Cardone

1990 ◽  
Vol 204 ◽  
Author(s):  
J.B. Cross ◽  
M.A. Hoffbauer ◽  
J.D. Farr ◽  
O.J. Glembocki ◽  
V.M. Bermudez

ABSTRACTOxide layers that are thick (>200 Å and uniform have been produced on GaAs (110) and (100) by reacting the substrate (Ts<160°C) with high translational energy (1-3 eV) neutral atomic oxygen at flux levels of∼50 monolayers/second. The Ga and As species are formed in their highest oxidation states, which implies formation of either Ga2O3 and As2O5 or GaAsO4. Raman spectroscopy indicates that there is no metallic (amorphous or crystalline) As in the oxide or at the interface between the oxide and substrate and that there is no appreciable oxidation induced disorder of the substrate as is seen in high temperature thermal oxidation processes.


2007 ◽  
Vol 414 (2) ◽  
pp. 152-154 ◽  
Author(s):  
P. K. Penskoi ◽  
V. F. Kostryukov ◽  
V. R. Pshestanchik ◽  
I. Ya. Mittova

1987 ◽  
Vol 23 (24) ◽  
pp. 1329 ◽  
Author(s):  
K.N. Bhat ◽  
N. Basu

2010 ◽  
Vol 36 (2) ◽  
pp. 238-246 ◽  
Author(s):  
E. V. Tomina ◽  
I. Ya. Mittova ◽  
A. S. Sukhochev ◽  
B. V. Sladkopevtsev

1989 ◽  
Vol 7 (1) ◽  
pp. 49-54 ◽  
Author(s):  
Othon R. Monteiro ◽  
James W. Evans

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