Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations

2006 ◽  
Vol 83 (4-9) ◽  
pp. 1078-1081 ◽  
Author(s):  
George P. Patsis ◽  
Evangelos Gogolides
Keyword(s):  
Molecular Weight ◽  
Polymer Chain ◽  
Stochastic Simulations ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
On Line

Molecular weight effect on line-edge roughness

2003 ◽  
Author(s):  
Toru Yamaguchi ◽  
Kenji Yamazaki ◽  
Hideo Namatsu
Keyword(s):  
Molecular Weight ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Weight Effect ◽  
On Line

scholarly journals Chemically Amplified Main Chain Scission: Chopping the Influence of Polymer Dimensions on Line Edge Roughness

2003 ◽  
Vol 16 (1) ◽  
pp. 13-18 ◽  
Author(s):  
Christian Eschbaumer ◽  
Nicole Heusinger ◽  
Marion Kern ◽  
Angela Jutgla ◽  
Christoph Hohle ◽  
...  
Keyword(s):  
Main Chain ◽  
Chain Scission ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
On Line
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