Molecular weight effect on line-edge roughness

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.084002 ◽

2014 ◽

Vol 53 (8) ◽

pp. 084002 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Molecular Weight ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resist ◽

On Line ◽

Protection Ratio

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Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations

Microelectronic Engineering ◽

10.1016/j.mee.2006.01.039 ◽

2006 ◽

Vol 83 (4-9) ◽

pp. 1078-1081 ◽

Cited By ~ 15

Author(s):

George P. Patsis ◽

Evangelos Gogolides

Keyword(s):

Molecular Weight ◽

Polymer Chain ◽

Stochastic Simulations ◽

Line Edge Roughness ◽

Chemically Amplified ◽

Edge Roughness ◽

On Line

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Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations

Microelectronic Engineering ◽

10.1016/j.mee.2004.06.005 ◽

2004 ◽

Vol 75 (3) ◽

pp. 297-308 ◽

Cited By ~ 38

Author(s):

G.P. Patsis ◽

V. Constantoudis ◽

E. Gogolides

Keyword(s):

Molecular Weight ◽

Monte Carlo ◽

Monte Carlo Simulations ◽

Line Edge Roughness ◽

Polymer Molecular Weight ◽

Edge Roughness ◽

On Line

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Effects of Photoresist Polymer Molecular Weight and Acid-Diffusion on Line-Edge Roughness

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.6341 ◽

2005 ◽

Vol 44 (8) ◽

pp. 6341-6348 ◽

Cited By ~ 14

Author(s):

G. P. Patsis ◽

E. Gogolides ◽

K. Van Werden

Keyword(s):

Molecular Weight ◽

Line Edge Roughness ◽

Polymer Molecular Weight ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line

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Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Cited By ~ 44

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

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Influence of image processing on line-edge roughness in CD-SEM measurement

10.1117/12.775664 ◽

2008 ◽

Cited By ~ 12

Author(s):

Atsuko Yamaguchi ◽

Jiro Yamamoto

Keyword(s):

Image Processing ◽

Line Edge Roughness ◽

Edge Roughness ◽

On Line

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Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I–Modeling and Simulation Method

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2283518 ◽

2013 ◽

Vol 60 (11) ◽

pp. 3669-3675 ◽

Cited By ~ 22

Author(s):

Xiaobo Jiang ◽

Runsheng Wang ◽

Tao Yu ◽

Jiang Chen ◽

Ru Huang

Keyword(s):

Modeling And Simulation ◽

Line Width ◽

Simulation Method ◽

Cmos Technology ◽

Line Edge Roughness ◽

Nanoscale Cmos ◽

Edge Roughness ◽

On Line

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Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.6187 ◽

2007 ◽

Vol 46 (9B) ◽

pp. 6187-6190 ◽

Cited By ~ 13

Author(s):

Hiroki Yamamoto ◽

Takahiro Kozawa ◽

Akinori Saeki ◽

Kazumasa Okamoto ◽

Seiichi Tagawa ◽

...

Keyword(s):

Polymer Structure ◽

Line Edge Roughness ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line

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Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.016503 ◽

2014 ◽

Vol 54 (1) ◽

pp. 016503

Author(s):

Takahiro Kozawa

Keyword(s):

Line Width ◽

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Defect Generation ◽

Chemically Amplified ◽

Edge Roughness ◽

On Line

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The Characterization of KrF Photoresists and the Effect of Different Chromophore Bulkiness on Line Edge Roughness (LER) for Submicron Technology

2006 IEEE International Conference on Semiconductor Electronics ◽

10.1109/smelec.2006.380781 ◽

2006 ◽

Author(s):

Ahmad Yusri Mohamed Bakri ◽

Mohd. Jeffery Manaf ◽

Kader Ibrahim Abdul Wahab ◽

Ibrahim Bin Ahmad

Keyword(s):

Line Edge Roughness ◽

Edge Roughness ◽

On Line

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