scholarly journals Nanostructure of thin silicon films by combining HRTEM, XRD and Raman spectroscopy measurements and the implication to the optical properties

2008 ◽  
Vol 254 (9) ◽  
pp. 2748-2754 ◽  
Author(s):  
Andreja Gajović ◽  
Davor Gracin ◽  
Igor Djerdj ◽  
Nenad Tomašić ◽  
Krunoslav Juraić ◽  
...  
2014 ◽  
Vol 104 (8) ◽  
pp. 081119 ◽  
Author(s):  
Shu-Yi Wang ◽  
Diana-Andra Borca-Tasciuc ◽  
Deborah A. Kaminski

2003 ◽  
Vol 762 ◽  
Author(s):  
I. Milostnaya ◽  
T. Allen ◽  
F. Gaspari ◽  
N.P. Kherani ◽  
D. Yeghikyan ◽  
...  

AbstractAmorphous (a-Si:H) and microcrystalline (μc-Si:H) hydrogenated silicon films were obtained using DC saddle field glow discharge. The structure of the films was determined by Raman spectroscopy, SEM and TEM. The optoelectronic characteristics of both a-Si:H and μcSi:H were investigated using FTIR, UV/VIS spectroscopy, dark electrical conductivity (σd) and photoconductivity (σph) measurements. Boron and phosphorous doping of a-Si:H and μc-Si:H films was also investigated. The results show that both a-Si:H and μc-Si:H undoped films are highly resistive (σd=10-8-10-10 Ω-1cm-1). The doping efficiency of μc-Si:H films is much higher than a-Si:H films. The Tauc gap for a-Si:H was in the range 1.8-1.9 eV and for μc-Si:H films it was in the range 1.9-2.5 eV. The photoconductivity measurements of undoped films indicate a higher photosensitivity of a-Si:H films (σph/σd=104)than that of μc-Si:H films (σph/σd=10-100).


2002 ◽  
Vol 715 ◽  
Author(s):  
P. Sanguino ◽  
M. Niehus ◽  
S. Koynov ◽  
P. Brogueira ◽  
R. Schwarz ◽  
...  

AbstractThe minority-carrier diffusion length in thin silicon films can be extracted from the electrically-detected transient grating method, EDTG, by a simple ambipolar analysis only in the case of lifetime dominated carrier transport. If the dielectric relaxation time, τdiel, is larger than the photocarrier response time, τR, then unexpected negative transient signals can appear in the EDTG result. Thin silicon films deposited by hot-wire chemical vapor deposition (HWCVD) near the amorphous-to-microcrystalline transition, where τR varies over a large range, appeared to be ideal candidates to study the interplay between carrier recombination and dielectric response. By modifying the ambipolar description to allow for a time-dependent carrier grating build-up and decay we can obtain a good agreement between analytical calculation and experimental results.


2021 ◽  
Vol 116 ◽  
pp. 111065
Author(s):  
Chen Li ◽  
Lingxi Ouyang ◽  
Xiaonan Li ◽  
Congcong Xu ◽  
Jiyang Xie ◽  
...  

2008 ◽  
Vol 354 (19-25) ◽  
pp. 2227-2230 ◽  
Author(s):  
J. Kočka ◽  
T. Mates ◽  
M. Ledinský ◽  
H. Stuchlíková ◽  
J. Stuchlík ◽  
...  

2006 ◽  
Vol 55 (5) ◽  
pp. 2523
Author(s):  
Huang Rui ◽  
Lin Xuan-Ying ◽  
Yu Yun-Peng ◽  
Lin Kui-Xun ◽  
Zhu Zu-Song ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document