chemical vapor deposition technique Latest Research Papers

Properties of nitrogen-doped indium oxide films prepared using chemical vapor deposition technique for photoelectrochemical application

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2021.125244 ◽

2022 ◽

Vol 275 ◽

pp. 125244

Author(s):

T.M. Aper ◽

F.K. Yam ◽

K.P. Beh

Keyword(s):

Chemical Vapor Deposition ◽

Indium Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Nitrogen Doped ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Indium Oxide Films

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Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2021.121204 ◽

2022 ◽

Vol 575 ◽

pp. 121204

Author(s):

Housheng Liu ◽

Naeem ul Haq Tariq ◽

Rifei Han ◽

Hanhui Liu ◽

Xinyu Cui ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxycarbide ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Organometallic Chemical Vapor Deposition

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Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Carbon letters ◽

10.1007/s42823-021-00309-3 ◽

2021 ◽

Author(s):

Mehmet Gürsoy ◽

Emre Çıtak ◽

Mustafa Karaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Large Area ◽

Chemical Vapor Deposition Technique ◽

Graphene Films ◽

Vapor Deposition Technique ◽

Pressure Chemical ◽

Uniform Deposition

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Direct-drive implosion experiment of diamond capsules fabricated with hot filament chemical vapor deposition technique

Physics of Plasmas ◽

10.1063/5.0065430 ◽

2021 ◽

Vol 28 (10) ◽

pp. 104501

Author(s):

K. Kawasaki ◽

D. Tanaka ◽

H. Yamada ◽

S. Ohmagari ◽

Y. Mokuno ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Direct Drive ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Hot Filament

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CALCULATION OF COVERAGE AND FLAKE SIZE OF MONOLAYERS GROWN BY CHEMICAL VAPOR DEPOSITION TECHNIQUE

Uludağ University Journal of The Faculty of Engineering ◽

10.17482/uumfd.779265 ◽

2021 ◽

pp. 203-214

Author(s):

Fırat ASLANCI ◽

Fatma CAN ◽

Merve ÖPER ◽

Nihan KOSKU PERKGÖZ

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Single-crystalline Fe7S8/Fe3O4 coated zero-valent iron synthesized with vacuum chemical vapor deposition technique: Enhanced reductive, oxidative and photocatalytic activity for water purification

Journal of Hazardous Materials ◽

10.1016/j.jhazmat.2020.123442 ◽

2021 ◽

Vol 401 ◽

pp. 123442

Author(s):

Hongyun Niu ◽

Yongliang Yang ◽

Weijia Zhao ◽

Hongzhou Lv ◽

Hui Zhang ◽

...

Keyword(s):

Photocatalytic Activity ◽

Chemical Vapor Deposition ◽

Water Purification ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zero Valent Iron ◽

Deposition Technique ◽

Single Crystalline ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Effect of temperature on morphologies and optical study of ZnO thin films deposited by aerosol assisted chemical vapor deposition technique

Semiconductor Science and Technology ◽

10.1088/1361-6641/abcdfa ◽

2020 ◽

Vol 36 (2) ◽

pp. 025007

Author(s):

Anil M Palve ◽

Shivram S Garje

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Thin Films ◽

Effect Of Temperature ◽

Optical Study ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Retraction notice to “A new perspective on structural and morphological properties of carbon nanotubes synthesized by Plasma Enhanced Chemical Vapor Deposition technique” [RINP (2017) 757–761]

Results in Physics ◽

10.1016/j.rinp.2020.103557 ◽

2020 ◽

Vol 19 ◽

pp. 103557

Author(s):

A. Salar Elahi ◽

K. Mikaili Agah ◽

M. Ghoranneviss

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Morphological Properties ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Retraction Notice ◽

New Perspective

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Ammonia assisted low temperature growth of In2O3 (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000038 ◽

2020 ◽

Vol 38 (3) ◽

pp. 033414

Author(s):

Santosh Kumar Yadav ◽

Souvik Das ◽

Nivedita Prasad ◽

Barun K. Barick ◽

Simran Arora ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Epitaxial Films ◽

Deposition Technique ◽

Temperature Growth ◽

Chemical Vapor Deposition Technique ◽

Sapphire Substrates ◽

Vapor Deposition Technique

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Effective gettering of in-situ phosphorus-doped polysilicon passivating contact prepared using plasma-enhanced chemical-vapor deposition technique

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2019.110256 ◽

2020 ◽

Vol 206 ◽

pp. 110256 ◽

Cited By ~ 3

Author(s):

Zhixue Wang ◽

Zunke Liu ◽

Mingdun Liao ◽

Dandan Huang ◽

Xueqi Guo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Phosphorus Doped

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chemical vapor deposition technique
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TOTAL DOCUMENTS

H-INDEX

Properties of nitrogen-doped indium oxide films prepared using chemical vapor deposition technique for photoelectrochemical application

Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique

Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Direct-drive implosion experiment of diamond capsules fabricated with hot filament chemical vapor deposition technique

CALCULATION OF COVERAGE AND FLAKE SIZE OF MONOLAYERS GROWN BY CHEMICAL VAPOR DEPOSITION TECHNIQUE

Single-crystalline Fe7S8/Fe3O4 coated zero-valent iron synthesized with vacuum chemical vapor deposition technique: Enhanced reductive, oxidative and photocatalytic activity for water purification

Effect of temperature on morphologies and optical study of ZnO thin films deposited by aerosol assisted chemical vapor deposition technique

Retraction notice to “A new perspective on structural and morphological properties of carbon nanotubes synthesized by Plasma Enhanced Chemical Vapor Deposition technique” [RINP (2017) 757–761]

Ammonia assisted low temperature growth of In2O3 (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique

Effective gettering of in-situ phosphorus-doped polysilicon passivating contact prepared using plasma-enhanced chemical-vapor deposition technique

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chemical vapor deposition techniqueRecently Published Documents

TOTAL DOCUMENTS

H-INDEX

Properties of nitrogen-doped indium oxide films prepared using chemical vapor deposition technique for photoelectrochemical application

Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique

Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Direct-drive implosion experiment of diamond capsules fabricated with hot filament chemical vapor deposition technique

CALCULATION OF COVERAGE AND FLAKE SIZE OF MONOLAYERS GROWN BY CHEMICAL VAPOR DEPOSITION TECHNIQUE

Single-crystalline Fe7S8/Fe3O4 coated zero-valent iron synthesized with vacuum chemical vapor deposition technique: Enhanced reductive, oxidative and photocatalytic activity for water purification

Effect of temperature on morphologies and optical study of ZnO thin films deposited by aerosol assisted chemical vapor deposition technique

Retraction notice to “A new perspective on structural and morphological properties of carbon nanotubes synthesized by Plasma Enhanced Chemical Vapor Deposition technique” [RINP (2017) 757–761]

Ammonia assisted low temperature growth of In2O3 (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique

Effective gettering of in-situ phosphorus-doped polysilicon passivating contact prepared using plasma-enhanced chemical-vapor deposition technique

chemical vapor deposition technique
Recently Published Documents