Surface characterization and depth profiling of biological molecules by electrospray droplet impact/SIMS

2011 ◽  
Vol 44 (2) ◽  
pp. 227-231 ◽  
Author(s):  
Daiki Asakawa ◽  
Kenzo Hiraoka
1987 ◽  
Vol 18 (3) ◽  
pp. 249-250 ◽  
Author(s):  
F. Michiels ◽  
W. Vanhoolst ◽  
W. Jacob ◽  
P. Van Espen ◽  
F. Adams

2009 ◽  
Vol 15 (3) ◽  
pp. 283-286 ◽  
Author(s):  
Yuji Sakai ◽  
Yoshitoki Iijima ◽  
Riou Takaishi ◽  
Daiki Asakawa ◽  
Kenzo Hiraoka

1985 ◽  
Vol 65 ◽  
Author(s):  
Christopher J. Macey

ABSTRACTSlagging difficulties encountered in large, pulverized coal-fired utility boilers can be alleviated by using recently developed chemical conditioners designed to inhibit the agglomeration of molten fly ash particles. Slagging results from the impaction and accretion on the boiler interior surfaces of molten ash particles in the flue gas resulting from the combustion of coal. Electron Spectroscopy for chemical Analysis (ESCA) and ion sputtering depth profiling were utilized to examine the mechanism whereby a fuel conditioner containing copper oxychloride effectively reduced slag deposition rates during a pilot-scale, pulverized coal combustion experiment.


2010 ◽  
Vol 42 (6-7) ◽  
pp. 658-661 ◽  
Author(s):  
Yuji Sakai ◽  
Yoshitoki Iijima ◽  
Daiki Asakawa ◽  
Kenzo Hiraoka

2010 ◽  
Vol 43 (1-2) ◽  
pp. 167-170 ◽  
Author(s):  
Yuji Sakai ◽  
Yoshitoki Iijima ◽  
Souichirou Mukou ◽  
Kenzo Hiraoka

1989 ◽  
Vol 1 (6) ◽  
pp. 625-634 ◽  
Author(s):  
Gar B. Hoflund ◽  
Mark R. Davidson ◽  
Eva Yngvadottir ◽  
Herbert A. Laitinen ◽  
Shigeo Hoshino

1997 ◽  
Vol 495 ◽  
Author(s):  
E. O. Bensadon ◽  
P. A. P. Nascente ◽  
L.O.S. Bulhões ◽  
E. C. Pereira

ABSTRACTA new methodology was developed to stabilized zirconia films at room temperature. The zirconium oxide films were prepared electrochemically by anodic oxidation of metallic zirconium at constant curcent density. X-ray diffraction (XRD) revealed the partial stabilization of the cubic phase in the ZrO2 films obtained in the presence of calcium. On the other hand, the films obtained in H3PO4 presented monoclinic phase. Scanning electron microscopy (SEM) showed that the oxide films obtained in calcium medium were porous, while the films obtained in H3PO4 were compact. X-ray photoelectron spectroscopy (XPS) identified ZrO2 and the intercalation of Na, N, P and CaO, as well as adventitious carbon. Using depth profiling, we observed that the concentrations of ZrO2, P and CaO increased with sputtering time.


Materials ◽  
2019 ◽  
Vol 12 (14) ◽  
pp. 2271 ◽  
Author(s):  
Sara Saketi ◽  
Jonas Östby ◽  
Ulf Bexell ◽  
Mikael Olsson

Using Ti6Al4V as a work material, a methodology to systematically investigate the diffusion degradation of cemented carbide during machining is proposed. The methodology includes surface characterization of as-tested worn inserts, wet etched worn inserts, metallographic cross-sectioned worn inserts as well as the back-side of the produced chips. Characterization techniques used include scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), Auger electron spectroscopy (AES) and time of flight secondary ion mass spectroscopy (ToF-SIMS). The results show that the characterization of wet etched worn inserts gives quick and useful information regarding the diffusion degradation of cemented carbide, in the present work the formation of a fine crystalline W layer (carbon depleted WC layer) at the tool-work material interface. The present study also illuminates the potential of AES analysis when it comes to analyzing the degradation of cemented carbide in contact with the work material during machining. The high surface sensitivity in combination with high lateral resolution makes it possible to analyze the worn cemented carbide surface on a sub-µm level. Especially AES sputter depth profiling, resulting in detailed information of variations in chemical composition across interfaces, is a powerful tool when it comes to understanding diffusion wear. Finally, the present work illustrates the importance of analyzing not only the worn tool but also the produced chips. An accurate characterization of the back-side of the chips will give important information regarding the wear mechanisms taking place at the tool rake face–chip interface. Surface analysis techniques such as AES and ToF-SIMS are well suited for this type of surface characterization.


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