A surface characterization and depth profiling study of conventional electrodeposited chromium films. 3

1989 ◽  
Vol 1 (6) ◽  
pp. 625-634 ◽  
Author(s):  
Gar B. Hoflund ◽  
Mark R. Davidson ◽  
Eva Yngvadottir ◽  
Herbert A. Laitinen ◽  
Shigeo Hoshino
Keyword(s):  
Surface Characterization ◽  
Depth Profiling ◽  
Chromium Films

Applications of image processing for surface characterization and depth profiling with SIMS

1987 ◽  
Vol 18 (3) ◽  
pp. 249-250 ◽  
Author(s):  
F. Michiels ◽  
W. Vanhoolst ◽  
W. Jacob ◽  
P. Van Espen ◽  
F. Adams
Keyword(s):  
Image Processing ◽  
Surface Characterization ◽  
Depth Profiling

Surface Characterization of the Mechanism for Decreased Boiler Slagging via Fly Ash Surface Modification

1985 ◽  
Vol 65 ◽  
Author(s):  
Christopher J. Macey
Keyword(s):  
Fly Ash ◽  
Flue Gas ◽  
Surface Characterization ◽  
Depth Profiling ◽  
Pilot Scale ◽  
Pulverized Coal ◽  
Pulverized Coal Combustion ◽  
Utility Boilers ◽  
Combustion Experiment

ABSTRACTSlagging difficulties encountered in large, pulverized coal-fired utility boilers can be alleviated by using recently developed chemical conditioners designed to inhibit the agglomeration of molten fly ash particles. Slagging results from the impaction and accretion on the boiler interior surfaces of molten ash particles in the flue gas resulting from the combustion of coal. Electron Spectroscopy for chemical Analysis (ESCA) and ion sputtering depth profiling were utilized to examine the mechanism whereby a fuel conditioner containing copper oxychloride effectively reduced slag deposition rates during a pilot-scale, pulverized coal combustion experiment.

Surface Characterization of Calcium-Stabilized Zirconia Film by X-Ray Photoelectron Spectroscopy

1997 ◽  
Vol 495 ◽  
Author(s):  
E. O. Bensadon ◽  
P. A. P. Nascente ◽  
L.O.S. Bulhões ◽  
E. C. Pereira
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Characterization ◽  
Oxide Films ◽  
Depth Profiling ◽  
Cubic Phase ◽  
X Ray Diffraction ◽  
Stabilized Zirconia ◽  
X Ray ◽  
Zirconia Film

ABSTRACTA new methodology was developed to stabilized zirconia films at room temperature. The zirconium oxide films were prepared electrochemically by anodic oxidation of metallic zirconium at constant curcent density. X-ray diffraction (XRD) revealed the partial stabilization of the cubic phase in the ZrO2 films obtained in the presence of calcium. On the other hand, the films obtained in H3PO4 presented monoclinic phase. Scanning electron microscopy (SEM) showed that the oxide films obtained in calcium medium were porous, while the films obtained in H3PO4 were compact. X-ray photoelectron spectroscopy (XPS) identified ZrO2 and the intercalation of Na, N, P and CaO, as well as adventitious carbon. Using depth profiling, we observed that the concentrations of ZrO2, P and CaO increased with sputtering time.

scholarly journals A Methodology to Systematically Investigate the Diffusion Degradation of Cemented Carbide during Machining of a Titanium Alloy

Materials ◽  
2019 ◽  
Vol 12 (14) ◽  
pp. 2271 ◽  
Author(s):  
Sara Saketi ◽  
Jonas Östby ◽  
Ulf Bexell ◽  
Mikael Olsson
Keyword(s):  
Surface Characterization ◽  
High Surface ◽  
Depth Profiling ◽  
Cemented Carbide ◽  
Back Side ◽  
Material Interface ◽  
Interface Surface ◽  
Tof Sims ◽  
Work Material

Using Ti6Al4V as a work material, a methodology to systematically investigate the diffusion degradation of cemented carbide during machining is proposed. The methodology includes surface characterization of as-tested worn inserts, wet etched worn inserts, metallographic cross-sectioned worn inserts as well as the back-side of the produced chips. Characterization techniques used include scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), Auger electron spectroscopy (AES) and time of flight secondary ion mass spectroscopy (ToF-SIMS). The results show that the characterization of wet etched worn inserts gives quick and useful information regarding the diffusion degradation of cemented carbide, in the present work the formation of a fine crystalline W layer (carbon depleted WC layer) at the tool-work material interface. The present study also illuminates the potential of AES analysis when it comes to analyzing the degradation of cemented carbide in contact with the work material during machining. The high surface sensitivity in combination with high lateral resolution makes it possible to analyze the worn cemented carbide surface on a sub-µm level. Especially AES sputter depth profiling, resulting in detailed information of variations in chemical composition across interfaces, is a powerful tool when it comes to understanding diffusion wear. Finally, the present work illustrates the importance of analyzing not only the worn tool but also the produced chips. An accurate characterization of the back-side of the chips will give important information regarding the wear mechanisms taking place at the tool rake face–chip interface. Surface analysis techniques such as AES and ToF-SIMS are well suited for this type of surface characterization.

Near-Surface Analysis and Depth Profiling by FT-IR Photoacoustic Spectroscopy

1987 ◽  
Vol 41 (5) ◽  
pp. 889-896 ◽  
Author(s):  
Charles Q. Yang ◽  
Randall R. Bresee ◽  
William G. Fateley
Keyword(s):  
Photoacoustic Spectroscopy ◽  
Surface Characterization ◽  
Glass Fibers ◽  
Depth Profiling ◽  
Chemical Additives ◽  
Near Surface ◽  
Poly Ethylene Terephthalate ◽  
Cotton Yarns ◽  
Ft Ir ◽  
Poly Ethylene

Fourier transform photoacoustic spectroscopy (FT-IR/PAS) has proven to be a powerful technique for the near-surface characterization of solid materials. The effective sampling depth of FT-IR/PAS can be varied by using different interferometer mirror velocities, so that nondestructive depth profiling can be performed. In this research, sized cotton yarns, treated glass fibers, chemically modified poly(ethylene terephthalate) fibers, and a naturally weathered poly(vinyl chloride) composite were investigated with the use of FT-IR/PAS at different mirror velocities. Penetration of the chemical additives in these materials was studied. It was demonstrated that FT-IR/PAS has the ability to investigate the changes in chemical nature within the detectable surface layers of solid samples.

The Use of Advanced Analytical Techniques for Characterization of the Chemical, Physical, and Crystallographic Nature of a Surface

1973 ◽  
Vol 31 ◽  
pp. 132-133 ◽  
Author(s):  
R. E. Herfert
Keyword(s):  
Surface Characterization ◽  
Analytical Techniques ◽  
X Ray Diffraction ◽  
Depth Of Penetration ◽  
X Ray ◽  
The Past ◽  
Transmission Electron ◽  
Scanning Electron

Studies of the nature of a surface, either metallic or nonmetallic, in the past, have been limited to the instrumentation available for these measurements. In the past, optical microscopy, replica transmission electron microscopy, electron or X-ray diffraction and optical or X-ray spectroscopy have provided the means of surface characterization. Actually, some of these techniques are not purely surface; the depth of penetration may be a few thousands of an inch. Within the last five years, instrumentation has been made available which now makes it practical for use to study the outer few 100A of layers and characterize it completely from a chemical, physical, and crystallographic standpoint. The scanning electron microscope (SEM) provides a means of viewing the surface of a material in situ to magnifications as high as 250,000X.

Preferential Sputtering of Ni3Al Single Crystals Studied Using Atom-Probe Field-Ion Microscopy and XPS

1981 ◽  
Vol 39 ◽  
pp. 16-17
Author(s):  
M.P. Thomas ◽  
A.R. Waugh ◽  
M.J. Southon ◽  
Brian Ralph
Keyword(s):  
Single Crystals ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Depth Profiling ◽  
Analytical Techniques ◽  
Atom Probe ◽  
Probe Field ◽  
Preferential Sputtering ◽  
Argon Ion Bombardment ◽  
Argon Ion

It is well known that ion-induced sputtering from numerous multicomponent targets results in marked changes in surface composition (1). Preferential removal of one component results in surface enrichment in the less easily removed species. In this investigation, a time-of-flight atom-probe field-ion microscope A.P. together with X-ray photoelectron spectroscopy XPS have been used to monitor alterations in surface composition of Ni3Al single crystals under argon ion bombardment. The A.P. has been chosen for this investigation because of its ability using field evaporation to depth profile through a sputtered surface without the need for further ion sputtering. Incident ion energy and ion dose have been selected to reflect conditions widely used in surface analytical techniques for cleaning and depth-profiling of samples, typically 3keV and 1018 - 1020 ion m-2.

Sign in / Sign up

Export Citation Format

Share Document