scholarly journals A Methodology to Systematically Investigate the Diffusion Degradation of Cemented Carbide during Machining of a Titanium Alloy

Materials ◽  
2019 ◽  
Vol 12 (14) ◽  
pp. 2271 ◽  
Author(s):  
Sara Saketi ◽  
Jonas Östby ◽  
Ulf Bexell ◽  
Mikael Olsson
Keyword(s):  
Surface Characterization ◽  
High Surface ◽  
Depth Profiling ◽  
Cemented Carbide ◽  
Back Side ◽  
Material Interface ◽  
Interface Surface ◽  
Tof Sims ◽  
Work Material

Using Ti6Al4V as a work material, a methodology to systematically investigate the diffusion degradation of cemented carbide during machining is proposed. The methodology includes surface characterization of as-tested worn inserts, wet etched worn inserts, metallographic cross-sectioned worn inserts as well as the back-side of the produced chips. Characterization techniques used include scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), Auger electron spectroscopy (AES) and time of flight secondary ion mass spectroscopy (ToF-SIMS). The results show that the characterization of wet etched worn inserts gives quick and useful information regarding the diffusion degradation of cemented carbide, in the present work the formation of a fine crystalline W layer (carbon depleted WC layer) at the tool-work material interface. The present study also illuminates the potential of AES analysis when it comes to analyzing the degradation of cemented carbide in contact with the work material during machining. The high surface sensitivity in combination with high lateral resolution makes it possible to analyze the worn cemented carbide surface on a sub-µm level. Especially AES sputter depth profiling, resulting in detailed information of variations in chemical composition across interfaces, is a powerful tool when it comes to understanding diffusion wear. Finally, the present work illustrates the importance of analyzing not only the worn tool but also the produced chips. An accurate characterization of the back-side of the chips will give important information regarding the wear mechanisms taking place at the tool rake face–chip interface. Surface analysis techniques such as AES and ToF-SIMS are well suited for this type of surface characterization.

scholarly journals Post-Processing and Surface Characterization of Additively Manufactured Stainless Steel 316L Lattice: Implications for BioMedical Use

Materials ◽  
2021 ◽  
Vol 14 (6) ◽  
pp. 1376
Author(s):  
Alex Quok An Teo ◽  
Lina Yan ◽  
Akshay Chaudhari ◽  
Gavin Kane O’Neill
Keyword(s):  
Surface Roughness ◽  
Stainless Steel ◽  
Surface Characterization ◽  
High Surface ◽  
Surface Characteristics ◽  
Post Processing ◽  
Stainless Steel 316L ◽  
Processing Methods ◽  
Particulate Debris

Additive manufacturing of stainless steel is becoming increasingly accessible, allowing for the customisation of structure and surface characteristics; there is little guidance for the post-processing of these metals. We carried out this study to ascertain the effects of various combinations of post-processing methods on the surface of an additively manufactured stainless steel 316L lattice. We also characterized the nature of residual surface particles found after these processes via energy-dispersive X-ray spectroscopy. Finally, we measured the surface roughness of the post-processing lattices via digital microscopy. The native lattices had a predictably high surface roughness from partially molten particles. Sandblasting effectively removed this but damaged the surface, introducing a peel-off layer, as well as leaving surface residue from the glass beads used. The addition of either abrasive polishing or electropolishing removed the peel-off layer but introduced other surface deficiencies making it more susceptible to corrosion. Finally, when electropolishing was performed after the above processes, there was a significant reduction in residual surface particles. The constitution of the particulate debris as well as the lattice surface roughness following each post-processing method varied, with potential implications for clinical use. The work provides a good base for future development of post-processing methods for additively manufactured stainless steel.

scholarly journals Surface Characterization of Polymer Blends by XPS and ToF-SIMS

Materials ◽  
2016 ◽  
Vol 9 (8) ◽  
pp. 655 ◽  
Author(s):  
Chi Chan ◽  
Lu-Tao Weng
Keyword(s):  
Polymer Blends ◽  
Surface Characterization ◽  
Tof Sims

scholarly journals 3D chemical characterization of frozen hydrated hydrogels using ToF-SIMS with argon cluster sputter depth profiling

2016 ◽  
Vol 11 (2) ◽  
pp. 02A301 ◽  
Author(s):  
Michael Taylor ◽  
David Scurr ◽  
Matthias Lutolf ◽  
Lee Buttery ◽  
Mischa Zelzer ◽  
...  
Keyword(s):  
Depth Profiling ◽  
Chemical Characterization ◽  
Tof Sims

Surface Characterization of the Mechanism for Decreased Boiler Slagging via Fly Ash Surface Modification

1985 ◽  
Vol 65 ◽  
Author(s):  
Christopher J. Macey
Keyword(s):  
Fly Ash ◽  
Flue Gas ◽  
Surface Characterization ◽  
Depth Profiling ◽  
Pilot Scale ◽  
Pulverized Coal ◽  
Pulverized Coal Combustion ◽  
Utility Boilers ◽  
Combustion Experiment

ABSTRACTSlagging difficulties encountered in large, pulverized coal-fired utility boilers can be alleviated by using recently developed chemical conditioners designed to inhibit the agglomeration of molten fly ash particles. Slagging results from the impaction and accretion on the boiler interior surfaces of molten ash particles in the flue gas resulting from the combustion of coal. Electron Spectroscopy for chemical Analysis (ESCA) and ion sputtering depth profiling were utilized to examine the mechanism whereby a fuel conditioner containing copper oxychloride effectively reduced slag deposition rates during a pilot-scale, pulverized coal combustion experiment.

scholarly journals Surface characterization of biological nanodomains using NP-ToF-SIMS

2012 ◽  
Vol 45 (1) ◽  
pp. 294-297 ◽  
Author(s):  
F. A. Fernandez-Lima ◽  
J. D. DeBord ◽  
E. A. Schweikert ◽  
S. Della-Negra ◽  
K. A. Kellersberger ◽  
...  
Keyword(s):  
Surface Characterization ◽  
Tof Sims

Physico-chemical Characterization of Thin Oxide Films: Difficulties and Solutions

2008 ◽  
Vol 1073 ◽  
Author(s):  
Thierry Conard ◽  
Wilfried Vandervorst
Keyword(s):  
Substrate Surface ◽  
Depth Profiling ◽  
Chemical Characterization ◽  
Surface Preparation ◽  
High Energy ◽  
Thin Layers ◽  
Back Side ◽  
Gate Stack ◽  
Metal Gates

ABSTRACTOxides have always been an integral part of semiconductor manufacturing both in front and back-end processing. With the necessary increase in performance, the demand on these oxides has been increasing leading to their (future) replacement by more complex materials, such as high-k's in gate oxide and metal gates. With the increasing material complexity, a thorough characterization of all aspects of these materials is necessary, covering, for instance, surfaces and interfaces, nucleation, growth, atomic structure, …This article focuses on the characterization of front-end oxides and their interfaces. It shows that detailed information can be achieved by sophisticated experimental techniques such as synchrotron radiation, high energy ERD or AtomProbe but that adequate sample preparation and/or analysis by a combination of more routinely available techniques may achieve similar results. This is shown through the study of three different systems/problems in the gate stack analysis. We will first focus on the determination of substrate surface preparation conditions before deposition and their influence on growth mode and the growth characteristics by different growth techniques (ALD, MOCVD, …). Second, we present the possibilities of compositional depth profiling of thin layers both with nuclear techniques and Angle-Resolved XPS. Finally, we will show that using conventional XPS and a combination of front and back-side analysis, the interface between high-k oxide and metal gates can be investigated. More examples of gate stack characterization can be found elsewhere

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