Large scale synthesis of pinhole-free shell-isolated nanoparticles (SHINs) using improved atomic layer deposition (ALD) method for practical applications

2015 ◽  
Vol 46 (12) ◽  
pp. 1200-1204 ◽  
Author(s):  
Wei Zhang ◽  
Jin-Chao Dong ◽  
Chao-Yu Li ◽  
Shu Chen ◽  
Chao Zhan ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Large Scale ◽  
Atomic Layer ◽  
Practical Applications ◽  
Layer Deposition ◽  
Large Scale Synthesis

scholarly journals Synthesis of a Rationally Designed Multi-Component Photocatalyst Pt:SiO2:TiO2(P25) with Improved Activity for Dye Degradation by Atomic Layer Deposition

Nanomaterials ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 1496 ◽  
Author(s):  
Dominik Benz ◽  
Hao Van Bui ◽  
Hubertus T. Hintzen ◽  
Michiel T. Kreutzer ◽  
J. Ruud van Ommen
Keyword(s):  
Atomic Layer Deposition ◽  
Dye Degradation ◽  
Atomic Layer ◽  
Oh Groups ◽  
Practical Applications ◽  
Beneficial Effects ◽  
Layer Deposition ◽  
The Individual ◽  
Materials Behavior

Photocatalysts for water purification typically lack efficiency for practical applications. Here we present a multi-component (Pt:SiO2:TiO2(P25)) material that was designed using knowledge of reaction mechanisms of mono-modified catalysts (SiO2:TiO2, and Pt:TiO2) combined with the potential of atomic layer deposition (ALD). The deposition of ultrathin SiO2 layers on TiO2 nanoparticles, applying ALD in a fluidized bed reactor, demonstrated in earlier studies their beneficial effects for the photocatalytic degradation of organic pollutants due to more acidic surface Si–OH groups which benefit the generation of hydroxyl radicals. Furthermore, our investigation on the role of Pt on TiO2(P25), as an improved photocatalyst, demonstrated that suppression of charge recombination by oxygen adsorbed on the Pt particles, reacting with the separated electrons to superoxide radicals, acts as an important factor for the catalytic improvement. Combining both materials into the resulting Pt:SiO2:TiO2(P25) nanopowder exceeded the dye degradation performance of both the individual SiO2:TiO2(P25) (1.5 fold) and Pt:TiO2(P25) (4-fold) catalysts by 6-fold as compared to TiO2(P25). This approach thus shows that by understanding the individual materials’ behavior and using ALD as an appropriate deposition technique enabling control on the nano-scale, new materials can be designed and developed, further improving the photocatalytic activity. Our research demonstrates that ALD is an attractive technology to synthesize multicomponent catalysts in a precise and scalable way.

Atomic Layer Deposition of Dielectrics on Ge and III–V Materials for Ultrahigh Performance Transistors

MRS Bulletin ◽  
2009 ◽  
Vol 34 (7) ◽  
pp. 493-503 ◽  
Author(s):  
Robert M. Wallace ◽  
Paul C. McIntyre ◽  
Jiyoung Kim ◽  
Yoshio Nishi
Keyword(s):  
Atomic Layer Deposition ◽  
Integrated Circuits ◽  
Large Scale ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Current Status ◽  
Scale Production ◽  
Transistor Channel ◽  
Layer Deposition ◽  
Field Effect Devices

AbstractThe prospect of utilizing alternative transistor channel materials for ultrahigh performance transistors will require suitable gate dielectrics for surface-channel field-effect devices. With the utilization of deposited gate dielectrics in large-scale production for Si-based integrated circuits by atomic layer deposition, extending this technology to channel materials that exhibit high bulk mobility behavior is of interest. A review of the current status for atomic layer deposited high-κ dielectrics on Ge and III–V channel materials is presented.

scholarly journals Thickness-dependent fast wetting transitions due to the atomic layer deposition of zinc oxide on a micro-pillared surface

RSC Advances ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 1120-1126 ◽  
Author(s):  
Libing Duan ◽  
Xiangyang Ji ◽  
Yajie Yang ◽  
Sihang Yang ◽  
Xinjun Lv ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Wetting Transitions ◽  
Practical Applications ◽  
Smart Surfaces ◽  
Layer Deposition ◽  
Fundamental Understanding ◽  
Water Collection

Smart surfaces promote the fundamental understanding of wetting and are widely used in practical applications for energy and water collection.

scholarly journals Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition

2019 ◽  
Vol 123 (44) ◽  
pp. 27196-27206 ◽  
Author(s):  
Sabrina Wack ◽  
Petru Lunca Popa ◽  
Noureddine Adjeroud ◽  
Jérôme Guillot ◽  
Bianca Rita Pistillo ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Large Scale ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Scale Deposition

scholarly journals Structural Evolution of Molybdenum Disulfide Prepared by Atomic Layer Deposition for Realization of Large Scale Films in Microelectronic Applications

2018 ◽  
Vol 1 (8) ◽  
pp. 4028-4037 ◽  
Author(s):  
Steven Letourneau ◽  
Matthias J. Young ◽  
Nicholas M. Bedford ◽  
Yang Ren ◽  
Angel Yanguas-Gil ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Molybdenum Disulfide ◽  
Large Scale ◽  
Structural Evolution ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition of TiO2 ultrathin films on 3D substrates for energy applications

2012 ◽  
Vol 1439 ◽  
pp. 63-68 ◽  
Author(s):  
Audrey Soum-Glaude ◽  
Liang Tian ◽  
Elisabeth Blanquet ◽  
Virginie Brizé ◽  
Laurent Cagnon ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Large Scale ◽  
Near Infrared ◽  
Atomic Layer ◽  
Anodic Alumina ◽  
Infrared Light ◽  
Energy Applications ◽  
Layer Deposition

ABSTRACTIn the present global environmental context, it becomes more and more critical to find efficient solutions to lower our energy consumption on one hand, and to produce energy from clean renewable sources on the other hand. Consequently, research efforts on materials for energy applications are intensifying.The present work aims at developing optoelectrical components usable for both energy saving (light emitting diodes) and renewable energy production (solar cells) by fabricating p-n heterojunctions based on a single semiconductor, titanium dioxide. TiO2 is indeed a very promising candidate: it is chemically and physically stable under irradiation, transparent to visible and near-infrared light (Eg= 3 – 3.5 eV), presents photocatalytic activity, is non-toxic and low cost, which permits to envisage its large scale use.In the present paper, the proposed architecture for both solar cells and LEDs is original as well as common for both applications: a three-dimensional architecture based on an anodic alumina nanoporous membrane which serves as nanomask for TiO2 growth in order to enlarge the effective surface of the components. TiO2is synthesized by Atomic Layer Deposition (ALD), a technique particularly well adapted to the deposition of ultrathin films (from one monolayer to few tens of nanometers) on 3D porous substrates patterned with high aspect ratio nanopores.In this work, the capacity of synthesizing 3D nanostructures is demonstrated. TiO2ultrathin films (10 to 100 nm) were grown by ALD on flat, micropatterned, microporous and nanoporous anodic alumina membranes (AAM) substrates. The films were highly conformal, as confirmed by SEM and TEM imaging. Both EDS and XPS analyses validated the dioxide film stoichiometry.

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