2012 SEMI Advanced Semiconductor Manufacturing Conference
Latest Publications

TOTAL DOCUMENTS

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By IEEE

9781467303514, 9781467303507

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

In-line metrology capability for epitaxial multi-stack SiGe layers

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212880 ◽

2012 ◽

Cited By ~ 3

Author(s):

D. Le Cunff ◽

S. Couvrat ◽

F. Abbate

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Optical metrology of thickness and indium composition of epitaxial InxGa1−xAs layers on Si substrates

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212872 ◽

2012 ◽

Author(s):

N. Waldron ◽

T. Orzali ◽

M. Caymax ◽

N. Horiguchi ◽

Youseung Jin ◽

...

Keyword(s):

Optical Metrology ◽

Si Substrates ◽

Indium Composition

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Identifying systematic critical features using silicon diagnosis data

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212858 ◽

2012 ◽

Cited By ~ 10

Author(s):

C. Schuermyer ◽

S. Malik ◽

T. Herrmann

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Real-time, continuous large particle monitoring for CMP slurry quality control

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212895 ◽

2012 ◽

Cited By ~ 1

Author(s):

A. Kim ◽

K. Murai ◽

M. Parkin ◽

R. Mavliev

Keyword(s):

Quality Control ◽

Real Time ◽

Large Particle ◽

Particle Monitoring

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Use of 22 nm Litho SEM non-visual defect data as a process quality indicator

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212931 ◽

2012 ◽

Author(s):

C. A. Boye ◽

C. J. Penny ◽

J. Connors ◽

D. Boyles ◽

C. Janicki ◽

...

Keyword(s):

Quality Indicator ◽

Process Quality ◽

Visual Defect

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IMPROVE simulation tool: Integrating heterogeneous simulation modules for semiconductor manufacturing processes

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212904 ◽

2012 ◽

Cited By ~ 1

Author(s):

N. Almeida ◽

J. Pires ◽

D. Sora

Keyword(s):

Semiconductor Manufacturing ◽

Manufacturing Processes ◽

Simulation Tool

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The analysis of device performance on a different shallow trench isolation (STI) liner scheme

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212900 ◽

2012 ◽

Author(s):

Sun Jong Wang ◽

Jun Sup Lee ◽

Sung Hun Kim ◽

Sung Gun Kang ◽

Yong-han Roh

Keyword(s):

Device Performance ◽

Shallow Trench Isolation ◽

Trench Isolation

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Lithography challenges and solutions for MEMS/LED/ABS applications

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212919 ◽

2012 ◽

Cited By ~ 1

Author(s):

H. R. Khorram ◽

J. Fukui ◽

S. Hagiwara ◽

S. Mizoroke ◽

M. Osanai ◽

...

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Predictive sampling approach to dynamically optimize defect density control operations

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212928 ◽

2012 ◽

Cited By ~ 1

Author(s):

M. Pfeffer ◽

R. Oechsner ◽

L. Pfitzner ◽

S. Eckert ◽

A. Hartmann ◽

...

Keyword(s):

Defect Density ◽

Density Control ◽

Sampling Approach

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MSC-clustering and forward stepwise regression for virtual metrology in highly correlated input spaces

2012 SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2012.6212866 ◽

2012 ◽

Cited By ~ 2

Author(s):

P. Prakash ◽

A. Schirru ◽

P. Hung ◽

S. McLoone

Keyword(s):

Stepwise Regression ◽

Virtual Metrology ◽

Forward Stepwise ◽

Highly Correlated

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2012 SEMI Advanced Semiconductor Manufacturing ConferenceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

In-line metrology capability for epitaxial multi-stack SiGe layers

Optical metrology of thickness and indium composition of epitaxial InxGa1−xAs layers on Si substrates

Identifying systematic critical features using silicon diagnosis data

Real-time, continuous large particle monitoring for CMP slurry quality control

Use of 22 nm Litho SEM non-visual defect data as a process quality indicator

IMPROVE simulation tool: Integrating heterogeneous simulation modules for semiconductor manufacturing processes

The analysis of device performance on a different shallow trench isolation (STI) liner scheme

Lithography challenges and solutions for MEMS/LED/ABS applications

Predictive sampling approach to dynamically optimize defect density control operations

MSC-clustering and forward stepwise regression for virtual metrology in highly correlated input spaces

2012 SEMI Advanced Semiconductor Manufacturing Conference
Latest Publications