34th European Mask and Lithography Conference
Latest Publications

TOTAL DOCUMENTS

29
(FIVE YEARS 0)

H-INDEX

2
(FIVE YEARS 0)

Published By SPIE

9781510621213, 9781510621220
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Fabrication of nanoparticles for biosensing using UV-NIL and lift-off

2018 ◽  
Author(s):  
Tina Mitteramskogler ◽  
Hubert Brueckl ◽  
Astrit Shoshi ◽  
Stefan Schrittwieser ◽  
Joerg Schotter ◽  
...  
Keyword(s):  
Lift Off

Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models

2018 ◽  
Author(s):  
Hubert Teyssedre ◽  
Patrick Quemere ◽  
Jacky Chartoire ◽  
Loïc Perraud ◽  
Florian Delachat ◽  
...  
Keyword(s):  
Predictive Models ◽  
Wafer Scale

Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography

2018 ◽  
Author(s):  
Claire van Lare ◽  
Frank Timmermans ◽  
Jo Finders ◽  
John McNamara ◽  
Eelco van Setten
Keyword(s):  
Euv Lithography ◽  
3D Effects

Fast local registration measurements for efficient e-beam writer qualification and correction

2018 ◽  
Author(s):  
Klaus-Dieter Roeth ◽  
Hendrik Steigerwald ◽  
Runyuan Han ◽  
Oliver Ache ◽  
Frank Laske

Manufacturing of roughness standard samples based on ACF/PSD model programming

2018 ◽  
Author(s):  
Jérôme Reche ◽  
Maxime Besacier ◽  
Patrice Gergaud ◽  
Yoann Blancquaert
Keyword(s):  
Standard Samples

Measuring inter-layer edge placement error with SEM contours

2018 ◽  
Author(s):  
François Weisbuch ◽  
Jirka Schatz ◽  
Matthias Ruhm

On the road to automated production workflows in the back end of line

2018 ◽  
Author(s):  
Gilles Tabbone ◽  
Kokila Egodage ◽  
Kristian Schulz ◽  
Anthony Garetto
Keyword(s):  
Automated Production ◽  
The Road ◽  
On The Road
Load More ...
Sign in / Sign up

Export Citation Format

Share Document