Fast local registration measurements for efficient e-beam writer qualification and correction

34th European Mask and Lithography Conference ◽

10.1117/12.2325627 ◽

2018 ◽

Cited By ~ 2

Author(s):

Klaus-Dieter Roeth ◽

Hendrik Steigerwald ◽

Runyuan Han ◽

Oliver Ache ◽

Frank Laske

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