IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005.
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Thoughts on an automation concept for complex production processes within a learning organization

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438792 ◽

2005 ◽

Author(s):

Hans-Joachim Schmidt Gerhard Luhn

Keyword(s):

Learning Organization ◽

Production Processes

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Polishing of bulk micro-machined substrates by fixed abrasive pads for smoothing and planarization of MEMS structures

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438758 ◽

2005 ◽

Author(s):

Martin Kulawski ◽

Hannu Luoto ◽

Kimmo Henttinen ◽

Tommi Suni ◽

Frauke Weimar ◽

...

Keyword(s):

Fixed Abrasive

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MOS transistor mismatch modelling for high voltage CMOS processes

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438805 ◽

2005 ◽

Cited By ~ 1

Author(s):

Werner Posch ◽

Gerhard Rappitsch ◽

Georg Leonardelli

Keyword(s):

High Voltage ◽

Mos Transistor ◽

Transistor Mismatch ◽

Cmos Processes

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Yield enhancement through fast statistical scan test analysis for digital logic

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438804 ◽

2005 ◽

Author(s):

Hans-Peter Erb ◽

Christian Burmer ◽

Andreas Leininger

Keyword(s):

Digital Logic ◽

Yield Enhancement ◽

Test Analysis ◽

Scan Test

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Process-window sensitive full-chip inspection for design-tosilicon optimization in the sub-wavelength era

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438769 ◽

2005 ◽

Cited By ~ 2

Author(s):

Scott Halle MaryJane Brodsky

Keyword(s):

Process Window ◽

Sub Wavelength

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New optical range inspection and improving optical response for spectroscopic based endpoint detection

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438761 ◽

2005 ◽

Author(s):

Giuseppe Fazio ◽

Pietro Petruzza ◽

Alessandro Spandre

Keyword(s):

Optical Response ◽

Endpoint Detection ◽

Optical Range

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Advanced cryogenic aerosol cleaning: application to damagefree cleaning of sensitive structured wafers

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438759 ◽

2005 ◽

Cited By ~ 1

Author(s):

Jeffrey M. Lauerhaas ◽

James F. Weygand ◽

Greg P. Thomes

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Low-yield flier wafer analysis strategies

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438785 ◽

2005 ◽

Author(s):

Travis D. Kirsch Brian A. Dunham

Keyword(s):

Analysis Strategies

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Fault detection in reactive ion etching systems using one-class support vector machines

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438783 ◽

2005 ◽

Cited By ~ 6

Author(s):

Tomas Sarmiento ◽

Sang J. Hong ◽

Gary S. May

Keyword(s):

Support Vector Machines ◽

Fault Detection ◽

Reactive Ion Etching ◽

Support Vector ◽

Ion Etching ◽

Vector Machines

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Scanner influences on resolution capabilities

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. ◽

10.1109/asmc.2005.1438789 ◽

2005 ◽

Author(s):

Holly H. Magoon

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IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005.Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Thoughts on an automation concept for complex production processes within a learning organization

Polishing of bulk micro-machined substrates by fixed abrasive pads for smoothing and planarization of MEMS structures

MOS transistor mismatch modelling for high voltage CMOS processes

Yield enhancement through fast statistical scan test analysis for digital logic

Process-window sensitive full-chip inspection for design-tosilicon optimization in the sub-wavelength era

New optical range inspection and improving optical response for spectroscopic based endpoint detection

Advanced cryogenic aerosol cleaning: application to damagefree cleaning of sensitive structured wafers

Low-yield flier wafer analysis strategies

Fault detection in reactive ion etching systems using one-class support vector machines

Scanner influences on resolution capabilities

IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005.
Latest Publications