Process-window sensitive full-chip inspection for design-tosilicon optimization in the sub-wavelength era

2005 ◽  
Author(s):  
Scott Halle MaryJane Brodsky
Keyword(s):  
Process Window ◽  
Sub Wavelength

Process-window sensitive full-chip inspection for design-to-silicon optimization in the sub-wavelength era

2005 ◽  
Author(s):  
Mary Jane Brodsky ◽  
Scott Halle ◽  
Vickie Jophlin-Gut ◽  
Lars Liebmann ◽  
Don Samuels ◽  
...  
Keyword(s):  
Process Window ◽  
Sub Wavelength

Dual Damascene Process for FatWires in Copper/FSG Technology

2003 ◽  
Vol 766 ◽  
Author(s):  
J. Gambino ◽  
T. Stamper ◽  
H. Trombley ◽  
S. Luce ◽  
F. Allen ◽  
...  
Keyword(s):  
Line Width ◽  
Lower Cost ◽  
Process Window ◽  
Cmos Process ◽  
Dual Damascene ◽  
Damascene Process ◽  
Interconnect Technology

AbstractA trench-first dual damascene process has been developed for fat wires (1.26 μm pitch, 1.1 μm thickness) in a 0.18 μm CMOS process with copper/fluorosilicate glass (FSG) interconnect technology. The process window for the patterning of vias in such deep trenches depends on the trench depth and on the line width of the trench, with the worse case being an intermediate line width (lines that are 3X the via diameter). Compared to a single damascene process, the dual damascene process has comparable yield and reliability, with lower via resistance and lower cost.

Canalization of Sub-wavelength Images by Electromagnetic Crystals

PIERS Online ◽  
2005 ◽  
Vol 1 (1) ◽  
pp. 37-41 ◽  
Author(s):  
Pavel A. Belov ◽  
C. R. Simovski
Keyword(s):  
Electromagnetic Crystals ◽  
Sub Wavelength

АЛГОРИТМ РАСЧЕТА ОКОН ПРОЦЕССА ФОТОЛИТОГРАФИИ НА ОСНОВЕ МОДЕЛИ РЕЗИСТА С ПОСТОЯННЫМ ПОРОГОМ

2020 ◽  
Vol 96 (3s) ◽  
pp. 756-757
Author(s):  
Е.С. Шамин ◽  
Е.Л. Харченко
Keyword(s):  
Process Window ◽  
Model Generation ◽  
Modeling Tools ◽  
Photolithography Process

Данная работа посвящена описанию возможного алгоритма создания моделей резиста с постоянным порогом и расчета окон процесса на их основе. Приведенные изыскания реализованы в виде программного средства, использующего средства моделирования фотолитографии Mentor Graphics Calibre. This work is dedicated to the description of one of possible algorithms of constant threshold resist model generation used for photolithography process window calculation. This algorithm has been realized in the form of a program using Mentor Graphics Calibre modeling tools.

The Solution of AIO-ET Via Open and Process Window Improvement

2020 ◽  
Author(s):  
Baichun Zhang ◽  
Jianguo Yang ◽  
Lei Sun ◽  
Quanbo Li ◽  
Jun Huang ◽  
...  
Keyword(s):  
Process Window

scholarly journals Observing and controlling a Tamm plasmon at the interface with a metasurface

Nanophotonics ◽  
2020 ◽  
Vol 9 (4) ◽  
pp. 897-903 ◽  
Author(s):  
Oleksandr Buchnev ◽  
Alexandr Belosludtsev ◽  
Victor Reshetnyak ◽  
Dean R. Evans ◽  
Vassili A. Fedotov
Keyword(s):  
Liquid Crystal ◽  
Metal Film ◽  
Near Infrared ◽  
Thin Metal Film ◽  
Outer Side ◽  
Spectral Position ◽  
External Perturbations ◽  
Dielectric Mirror ◽  
Wavelength Scale ◽  
Sub Wavelength

AbstractWe demonstrate experimentally that Tamm plasmons in the near infrared can be supported by a dielectric mirror interfaced with a metasurface, a discontinuous thin metal film periodically patterned on the sub-wavelength scale. More crucially, not only do Tamm plasmons survive the nanopatterning of the metal film but they also become sensitive to external perturbations as a result. In particular, by depositing a nematic liquid crystal on the outer side of the metasurface, we were able to red shift the spectral position of Tamm plasmon by 35 nm, while electrical switching of the liquid crystal enabled us to tune the wavelength of this notoriously inert excitation within a 10-nm range.

Topological interface states in translational metamaterials for sub-wavelength in-plane waves

2021 ◽  
Vol 197 ◽  
pp. 106308
Author(s):  
Yijie Liu ◽  
Liang Jin ◽  
Hongfa Wang ◽  
Dongying Liu ◽  
Yingjing Liang
Keyword(s):  
Plane Waves ◽  
Interface States ◽  
Sub Wavelength
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