Epitaxial Indium Tin Oxide Film Deposited on Sapphire Substrate by Solid-Source Electron Cyclotron Resonance Plasma

2012 ◽  
Vol 51 (1S) ◽  
pp. 01AC02 ◽  
Author(s):  
Satoru Kaneko ◽  
Hironori Torii ◽  
Masayasu Soga ◽  
Kensuke Akiyama ◽  
Motoaki Iwaya ◽  
...  
Keyword(s):  
Oxide Film ◽  
Sapphire Substrate ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Surface Modification of Indium-tin Oxide Thin Films by Electron Cyclotron Resonance Plasma Treatment

Shinku ◽  
2003 ◽  
Vol 46 (5) ◽  
pp. 469-472
Author(s):  
Yoshiharu KAKEHI ◽  
Kazuo SATOH ◽  
Akihide KITABATAKE ◽  
Soichi OGAWA ◽  
Yoshiyuki NAKAJIMA ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Modification ◽  
Plasma Treatment ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

scholarly journals The Influence of Precleaning Process on the Gate Oxide Film Fabricated by Electron Cyclotron Resonance Plasma Oxidation

1997 ◽  
Vol 144 (1) ◽  
pp. 311-314 ◽  
Author(s):  
Kow‐Ming Chang ◽  
Chii‐Horng Li ◽  
Fu‐Jier Fahn ◽  
Jung‐Yu Tsai ◽  
Ta‐Hsun Yeh ◽  
...  
Keyword(s):  
Oxide Film ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Gate Oxide ◽  
Electron Cyclotron ◽  
Plasma Oxidation ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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