Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation

Morito Matsuoka; Shun‐ichi Tohno

doi:10.1116/1.579484

Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579484 ◽

1995 ◽

Vol 13 (5) ◽

pp. 2427-2434 ◽

Cited By ~ 9

Author(s):

Morito Matsuoka ◽

Shun‐ichi Tohno

Keyword(s):

Oxide Film ◽

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Radio Frequency Sputtering ◽

Resonance Plasma

Download Full-text

Ta-O (Ta-oxide) and Nb-O (Nb-oxide) Film Deposition Using an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l411 ◽

1985 ◽

Vol 24 (Part 2, No. 6) ◽

pp. L411-L413 ◽

Cited By ~ 5

Author(s):

Iwao Watanabe ◽

Hideo Yoshihara

Keyword(s):

Oxide Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Electron cyclotron resonance plasma source for conductive film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579309 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1281-1286 ◽

Cited By ~ 31

Author(s):

Toshiro Ono ◽

Hiroshi Nishimura ◽

Masaru Shimada ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Conductive Film ◽

Resonance Plasma

Download Full-text

Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l802 ◽

1993 ◽

Vol 32 (Part 2, No. 6A) ◽

pp. L802-L805 ◽

Cited By ~ 3

Author(s):

Akira Ishii ◽

Yoshiyuki Sakaguchi ◽

Shoichiro Minomo ◽

Michio Taniguchi ◽

Masato Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Diamond Like Carbon Film ◽

Resonance Plasma

Download Full-text

Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Super‐wide electron cyclotron resonance plasma source excited by traveling microwave as an efficient tool for diamondlike carbon film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579302 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1241-1243

Author(s):

A. Ishii ◽

S. Amadatsu ◽

S. Minomo ◽

M. Taniguchi ◽

M. Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Efficient Tool ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

Download Full-text

Effect of preoxidation on deposition of thin gate-quality silicon oxide film at low temperature by using a sputter-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.366431 ◽

1997 ◽

Vol 82 (11) ◽

pp. 5680-5685 ◽

Cited By ~ 26

Author(s):

D. W. Gao ◽

Y. Kashiwazaki ◽

K. Muraoka ◽

H. Nakashima ◽

K. Furukawa ◽

...

Keyword(s):

Low Temperature ◽

Oxide Film ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Oxide Film ◽

Resonance Plasma

Download Full-text

Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/25/2/076 ◽

2008 ◽

Vol 25 (2) ◽

pp. 636-639 ◽

Cited By ~ 6

Author(s):

Zhang Hai-Yan ◽

Ye Chao ◽

Ning Zhao-Yuan

Keyword(s):

Mass Spectrometry ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Inversion from selective homoepitaxy of Si to selective Si film deposition on SiO2using an ultraclean electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.108018 ◽

1992 ◽

Vol 61 (24) ◽

pp. 2908-2910 ◽

Cited By ~ 3

Author(s):

Takashi Matsuura ◽

Tadahiro Ohmi ◽

Junichi Murota ◽

Shoichi Ono

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

400 kHz radio-frequency biased electron cyclotron resonance plasma etching for Al–Si–Cu patterning

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585452 ◽

1991 ◽

Vol 9 (3) ◽

pp. 1471 ◽

Cited By ~ 4

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Effects of radio‐frequency bias on GaAs surfaces etched by Ar‐electron‐cyclotron‐resonance plasma

Journal of Applied Physics ◽

10.1063/1.345489 ◽

1990 ◽

Vol 67 (5) ◽

pp. 2591-2595 ◽

Cited By ~ 5

Author(s):

S. K. Noh ◽

K. Ishibashi ◽

Y. Aoyagi ◽

S. Namba ◽

Y. Yoshizako

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text