Surface Modification of Indium-tin Oxide Thin Films by Electron Cyclotron Resonance Plasma Treatment

Yoshiharu KAKEHI; Kazuo SATOH; Akihide KITABATAKE; Soichi OGAWA; Yoshiyuki NAKAJIMA; Nobuo NAKANO

doi:10.3131/jvsj.46.469

Surface Modification of Indium-tin Oxide Thin Films by Electron Cyclotron Resonance Plasma Treatment

Shinku ◽

10.3131/jvsj.46.469 ◽

2003 ◽

Vol 46 (5) ◽

pp. 469-472

Author(s):

Yoshiharu KAKEHI ◽

Kazuo SATOH ◽

Akihide KITABATAKE ◽

Soichi OGAWA ◽

Yoshiyuki NAKAJIMA ◽

...

Keyword(s):

Thin Films ◽

Surface Modification ◽

Plasma Treatment ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Factors driving c-axis orientation and disorientation of LiNbO3 thin films deposited on TiN and indium tin oxide by electron cyclotron resonance plasma sputtering

Journal of Applied Physics ◽

10.1063/1.2204817 ◽

2006 ◽

Vol 99 (12) ◽

pp. 124103 ◽

Cited By ~ 14

Author(s):

H. Akazawa ◽

M. Shimada

Keyword(s):

Thin Films ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Axis Orientation ◽

Plasma Sputtering ◽

Resonance Plasma

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Epitaxial Indium Tin Oxide Film Deposited on Sapphire Substrate by Solid-Source Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.01ac02 ◽

2012 ◽

Vol 51 (1) ◽

pp. 01AC02 ◽

Cited By ~ 1

Author(s):

Satoru Kaneko ◽

Hironori Torii ◽

Masayasu Soga ◽

Kensuke Akiyama ◽

Motoaki Iwaya ◽

...

Keyword(s):

Oxide Film ◽

Sapphire Substrate ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Epitaxial Indium Tin Oxide Film Deposited on Sapphire Substrate by Solid-Source Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.01ac02 ◽

2012 ◽

Vol 51 (1S) ◽

pp. 01AC02 ◽

Cited By ~ 5

Author(s):

Satoru Kaneko ◽

Hironori Torii ◽

Masayasu Soga ◽

Kensuke Akiyama ◽

Motoaki Iwaya ◽

...

Keyword(s):

Oxide Film ◽

Sapphire Substrate ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Dielectric Permittivity of Amorphous and Hexagonal Electron Cyclotron Resonance Plasma Deposited Ta[sub 2]O[sub 5] Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1390814 ◽

1999 ◽

Vol 2 (6) ◽

pp. 291 ◽

Cited By ~ 11

Author(s):

C. Chaneliere

Keyword(s):

Thin Films ◽

Dielectric Permittivity ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Induction of octacalcium phosphate by surface modification of TiO2 film prepared by electron cyclotron resonance plasma oxidation

Interface Oral Health Science 2007 ◽

10.1007/978-4-431-76690-2_69 ◽

2008 ◽

pp. 317-321

Author(s):

Yusuke Orii ◽

Hiroshi Masumoto ◽

Takashi Goto ◽

Yoshitomo Honda ◽

Takahisa Anada ◽

...

Keyword(s):

Surface Modification ◽

Tio2 Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Octacalcium Phosphate ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153464 ◽

2015 ◽

Author(s):

L.C. Hu ◽

Y.W. Lin ◽

C.J. Wang ◽

T. C. Wei ◽

C.R. Yang ◽

...

Keyword(s):

Magnetic Field ◽

Thin Films ◽

Plasma Diagnostics ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Field Effects ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Resonance Magnetic Field

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Optical Properties of c-Axis Oriented Ba2NaNb5O15 Thin Films Formed by Electron Cyclotron Resonance Plasma Sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.105.687 ◽

1997 ◽

Vol 105 (1224) ◽

pp. 687-689

Author(s):

Akira WATAZU ◽

Hiroshi MASUMOTO ◽

Yoichiro MASUDA ◽

Toshio HIRAI

Keyword(s):

Thin Films ◽

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Cited By ~ 3

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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