scholarly journals The Influence of Precleaning Process on the Gate Oxide Film Fabricated by Electron Cyclotron Resonance Plasma Oxidation

1997 ◽  
Vol 144 (1) ◽  
pp. 311-314 ◽  
Author(s):  
Kow‐Ming Chang ◽  
Chii‐Horng Li ◽  
Fu‐Jier Fahn ◽  
Jung‐Yu Tsai ◽  
Ta‐Hsun Yeh ◽  
...  
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