scholarly journals Low‐Temperature PureB CVD Technology for CMOS Compatible Photodetectors

10.5772/63344 ◽  
2016 ◽  
Author(s):  
Vahid Mohammadi ◽  
Stoyan Nihtianov
Keyword(s):  
Low Temperature ◽  
Cmos Compatible

A Novel Latching Relay Fabricated Using an Oxide Molded Tungsten Process

2005 ◽  
Vol 872 ◽  
Author(s):  
J.G. Fleming ◽  
Michael Baker ◽  
David Luck
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Tensile Stress ◽  
Vapor Deposition ◽  
Chemical Mechanical Polishing ◽  
Chemical Vapor ◽  
Metal Contacts ◽  
Cmos Compatible ◽  
Mems Device ◽  
Very High

AbstractIn this paper we describe an oxide molded tungsten process applied to the fabrication of a novel latching relay. The steps in the process are: deposition of a sacrificial oxide, patterning of the oxide, filling of the resulting mold with a blanket film of tungsten using chemical vapor deposition (CVD), and then the removal and planarization of excess tungsten through chemical mechanical polishing (CMP). The process for the incorporation of dielectric isolation has also been developed. The resulting tungsten structures are under high tensile stress, which appears to be compensated in process by the compressive stress of the oxide mold. All the steps are low temperature and the entire process is backend CMOS compatible. This process has been used to fabricate a latching relay which relies on the internal stress of the tungsten and always generates force in a pulling mode. Parts have been successfully fabricated and tested, the devices generate very high forces for a MEMS device and give reasonable contact resistances even without noble metal contacts.

Novel low-temperature CMOS-compatible full-wafer-bonding process for the fabrication of 3D embedded microchannels using SU-8

2004 ◽  
Author(s):  
Francisco J. Blanco ◽  
Maria Agirregabiria ◽  
Maria Tijero ◽  
Javier Berganzo ◽  
Jorge Garcia ◽  
...  
Keyword(s):  
Low Temperature ◽  
Wafer Bonding ◽  
Bonding Process ◽  
Cmos Compatible

A CMOS compatible low temperature process for photonic crystal MEMS scanner

2009 ◽  
Author(s):  
K. Takahashi ◽  
I. W. Jung ◽  
A. Higo ◽  
Y. Mita ◽  
H. Fujita ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Low Temperature ◽  
Cmos Compatible ◽  
Low Temperature Process

A low temperature fabrication process utilizing FIB implantation for CMOS compatible photovoltaic cells

2010 ◽  
Author(s):  
Jasbir N. Patel ◽  
Clinton Landrock ◽  
Badr Omrane ◽  
Bozena Kaminska ◽  
Bonnie L. Gray
Keyword(s):  
Low Temperature ◽  
Photovoltaic Cells ◽  
Fabrication Process ◽  
Cmos Compatible

CMOS-compatible Si metasurface at visible wavelengths prepared by low-temperature green laser annealing

2018 ◽  
Vol 30 (4) ◽  
pp. 045301
Author(s):  
Jeong Yub Lee ◽  
Yongsung Kim ◽  
Seunghoon Han ◽  
Jaekwan Kim ◽  
Jae Woong Yoon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Laser Annealing ◽  
Green Laser ◽  
Cmos Compatible ◽  
Visible Wavelengths

scholarly journals A Low Temperature Bi-CMOS Compatible Process for MEMS RF Resonators and Filters

2002 ◽  
Author(s):  
J.L. Lund ◽  
C.V. Jahnes ◽  
H. Deligianni ◽  
L.P. Buchwalter ◽  
J.M. Cotte ◽  
...  
Keyword(s):  
Low Temperature ◽  
Cmos Compatible
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