Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching
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Published By Elsevier

9780080925134

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Cited By ~ 8

Author(s):

OLEG A. POPOV

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Front Matter

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50002-7 ◽

1994 ◽

pp. iii

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Subject Index

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50011-8 ◽

1994 ◽

pp. 323-328

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The Formation of Particles in Thin-Film Processing Plasmas

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50009-x ◽

1994 ◽

pp. 289-318 ◽

Cited By ~ 3

Author(s):

CHRISTOPH STEINBRÜCHEL

Keyword(s):

Thin Film ◽

Film Processing ◽

Thin Film Processing

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Preface

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50005-2 ◽

1994 ◽

pp. xi-xii ◽

Cited By ~ 2

Author(s):

M.H. Francombe ◽

J.L. Vossen

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Contributors to This Volume

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50001-5 ◽

1994 ◽

pp. ii

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Contributors

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50004-0 ◽

1994 ◽

pp. ix

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Copyright page

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50003-9 ◽

1994 ◽

pp. iv

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Unbalanced Magnetron Sputtering

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50008-8 ◽

1994 ◽

pp. 235-288 ◽

Cited By ~ 3

Author(s):

SUZANNE L. ROHDE

Keyword(s):

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Design of High-Density Plasma Sources for Materials Processing

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50006-4 ◽

1994 ◽

pp. 1-119 ◽

Cited By ~ 48

Author(s):

MICHAEL A. LIEBERMAN ◽

RICHARD A. GOTTSCHO

Keyword(s):

High Density ◽

Materials Processing ◽

Plasma Sources ◽

Density Plasma

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Physics of Thin Films - Plasma Sources for Thin Film Deposition and EtchingLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Front Matter

Subject Index

The Formation of Particles in Thin-Film Processing Plasmas

Preface

Contributors to This Volume

Contributors

Copyright page

Unbalanced Magnetron Sputtering

Design of High-Density Plasma Sources for Materials Processing

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching
Latest Publications