Formation of Thin Si Oxide Films on n-Type Si(100) Substrates Prepared by Low-Energy Oxygen Ion Bombardment.
1988 ◽
Vol 6
(1)
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pp. 466
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Keyword(s):
2018 ◽
Vol 441
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pp. 218-222
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2015 ◽
Vol 37
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pp. 190-198
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1986 ◽
Vol 4
(3)
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pp. 1236-1239
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2003 ◽
Vol 206
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pp. 348-352
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