Property modification of ferroelectric Pb(Zr,Ti)O3thin films by low‐energy oxygen ion bombardment during film growth

1992 ◽  
Vol 61 (10) ◽  
pp. 1246-1248 ◽  
Author(s):  
H. Hu ◽  
S. B. Krupanidhi
Keyword(s):  
Film Growth ◽  
Ion Bombardment ◽  
Low Energy ◽  
Oxygen Ion ◽  
Property Modification

Suppression of self-organized surface nanopatterning on GaSb/InAs multilayers induced by low energy oxygen ion bombardment by using simultaneously sample rotation and oxygen flooding

2018 ◽  
Vol 441 ◽  
pp. 218-222 ◽  
Author(s):  
Georges Beainy ◽  
Tiphaine Cerba ◽  
Franck Bassani ◽  
Mickaël Martin ◽  
Thierry Baron ◽  
...  
Keyword(s):  
Ion Bombardment ◽  
Low Energy ◽  
Sample Rotation ◽  
Self Organized ◽  
Oxygen Ion

Formation of self-organized nano-surfaces on III–V semiconductors by low energy oxygen ion bombardment

2015 ◽  
Vol 37 ◽  
pp. 190-198 ◽  
Author(s):  
A.G. Hernández ◽  
Yu. Kudriavtsev ◽  
S. Gallardo ◽  
M. Avendaño ◽  
R. Asomoza
Keyword(s):  
Ion Bombardment ◽  
Low Energy ◽  
Self Organized ◽  
Oxygen Ion

scholarly journals Oxidation of molybdenum by low-energy oxygen-ion bombardment

2017 ◽  
Vol 51 (4) ◽  
pp. 617-621 ◽  
Author(s):  
I. Jelovica Badovinac ◽  
I. Kavre Piltaver ◽  
I. Šarić ◽  
R. Peter ◽  
M. Petravić
Keyword(s):  
Ion Bombardment ◽  
Low Energy ◽  
Oxygen Ion

scholarly journals Formation of Thin Si Oxide Films on n-Type Si(100) Substrates Prepared by Low-Energy Oxygen Ion Bombardment.

Shinku ◽  
1992 ◽  
Vol 35 (1) ◽  
pp. 8-14
Author(s):  
Kouichi USAMI ◽  
Hiroshi OKABE ◽  
Tadayuki KOBAYASHI ◽  
Kuniyoshi YOKOO ◽  
Toshinari GOTO
Keyword(s):  
Oxide Films ◽  
Ion Bombardment ◽  
Low Energy ◽  
Oxygen Ion

Ion Beam Induced Growth Structure of Fluorite Type Oxide Films for Biaxially Textured HYSC Coated Conductors

1999 ◽  
Vol 585 ◽  
Author(s):  
Y. Iijima ◽  
M. Kimura ◽  
T. Saitoh
Keyword(s):  
Film Growth ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Coated Conductors ◽  
Low Energy ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Fluorite Type ◽  
Pyrochlore Type ◽  
Oxide Crystals

AbstractBiaxially aligned film growth by dual-ion-beam sputtering methods were studied for fluorite type (Zr0.85Y0.15O1.93(YSZ), Hf0.74Yb0.26O1.87, CeO2), pyrochlore type (Zr2Sm2O7), and rare-earth C type (Y2O3, Sm2O3) oxides on polycrystalline Ni-based alloy substrates. Cubetextured (all axes aligned with a <100> axis substrate normal) films were obtained for fluorite and pyrochlore ones by low energy (<300 eV) ion bombardment at low temperatures (< 300 °C). Besides, cube textured Y2O3 films were obtained in far narrower conditions with a quite low energy (150 eV)-ion bombardment at the temperature of 300 °C. The assisting ion energy dependence was discussed in connection with lattice energies for these oxide crystals.

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