High-Density Plasma Source for Large-Area Chemical Vapor Deposition of Diamond Films.

1994 ◽  
Author(s):  
Xing Chen
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Plasma Source ◽  
High Density ◽  
Large Area ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma

Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition

1999 ◽  
Vol 27 (5) ◽  
pp. 1317-1328 ◽  
Author(s):  
J.L. Giuliani ◽  
V.A. Shamamian ◽  
R.E. Thomas ◽  
J.P. Apruzese ◽  
M. Mulbrandon ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Two Dimensional ◽  
Dimensional Model ◽  
Large Area ◽  
Inductively Coupled ◽  
Two Dimensional Model
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