Control of Plasma Damage to Gate Oxide during High Density Plasma Chemical Vapor Deposition

1995 ◽  
Vol 142 (11) ◽  
pp. L208-L211 ◽  
Author(s):  
Subhas Bothra ◽  
Calvin T. Gabriel ◽  
Stephan Lassig ◽  
David Pirkle
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Gate Oxide ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Damage ◽  
Plasma Chemical Vapor Deposition ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma
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