Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SiC:H

2004 ◽  
Vol 22 (3) ◽  
pp. 1067 ◽  
Author(s):  
F. M. Pan ◽  
B. W. Wu ◽  
A. T. Cho ◽  
K. C. Tsai ◽  
T. G. Tsai ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Density ◽  
Nanoporous Silica ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silica Thin Films ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma
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