Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition
1999 ◽
Vol 27
(5)
◽
pp. 1317-1328
◽
1995 ◽
Vol 16
(S1)
◽
pp. S57-S69
◽
1994 ◽
Vol 37
(10)
◽
pp. 1535-1543
◽
2001 ◽
Vol 10
(3-7)
◽
pp. 388-392
◽
Keyword(s):
Keyword(s):
2002 ◽
Vol 41
(Part 2, No. 12B)
◽
pp. L1495-L1498
◽