scholarly journals Cu–Mo Thin Film Electrodeposited at a Rate of Megahertz by a Rectangular Pulse Current Technique

2017 ◽  
pp. 1193-1202 ◽  
Author(s):  
M Saitou ◽  
Keyword(s):  
Thin Film ◽  
Pulse Current ◽  
Rectangular Pulse ◽  
Current Technique

Multiple Quantum Barrier Nano-avalanche Photodiodes - Part III: Time and Frequency Responses

2019 ◽  
Vol 9 (2) ◽  
pp. 192-197
Author(s):  
Somrita Ghosh ◽  
Aritra Acharyya
Keyword(s):  
Optical Pulse ◽  
Pulse Current ◽  
Avalanche Photodiodes ◽  
Simulation Method ◽  
Rectangular Pulse ◽  
Operating Conditions ◽  
Multiple Quantum ◽  
Material System ◽  
Frequency Responses ◽  
The Fourier Transform

Background: The time and frequency responses of Multiple Quantum Barrier (MQB) nano-scale Avalanche Photodiodes (APDs) based on Si~3C-SiC material system have been investigated in this final part. Methods: A very narrow rectangular pulse of pulse-width of 0.4 ps has been used as the input optical pulse having 850 nm wavelength incidents on the p+-side of the MQB APD structures and corresponding current responses have been calculated by using a simulation method developed by the authors. Results: Finally the frequency responses of the devices are obtained via the Fourier transform of the corresponding pulse current responses in time domain. Conclusion: Simulation results show that MQB nano-APDs possess significantly faster time response and wider frequency response as compared to the flat Si nano-APDs under similar operating conditions.

scholarly journals Pit morphology of aluminum under anodic rectangular pulse current etching in HCl.

1989 ◽  
Vol 40 (1) ◽  
pp. 160-161 ◽  
Author(s):  
Eiichi SUGANUMA ◽  
Yuji TANNO ◽  
Takeshi ITO
Keyword(s):  
Pulse Current ◽  
Rectangular Pulse

Fabrication Lead Dioxide Coating by Pulse Current Method

2012 ◽  
Vol 581-582 ◽  
pp. 590-594
Author(s):  
Xu Dong Lv ◽  
Xue Tao Yuan ◽  
Zhi Qiang Hua ◽  
Lei Wang ◽  
Tao Li ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Relaxation Time ◽  
Current Density ◽  
Pulse Current ◽  
Lead Dioxide ◽  
Current Method ◽  
Pulse Time ◽  
Current Technique ◽  
Scanning Electron

Prepared lead dioxide（PbO2） coating on a Ti substrate by pulse current technique. The effect of the pulse current density, pulse time and relaxation time on the morphology and electrochemistry properties of the coating was studied by means of scanning electron microscopy and electrochemistry station. Compared with lead dioxide fabricate by common electroplate technique, lead dioxide coating prepared by pulse current technique is more dense, without hole, better corrosion resisting property and more stable electrochemistry properties.

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