Deep Level Spectra of Ion-Implantation Defects and Slip Dislocations Introduced by CO2 Laser

1985 ◽  
Vol 52 ◽  
Author(s):  
X. M. Bao ◽  
X. Y. Zhang ◽  
C. E. Liu ◽  
X. Q. Zheng

ABSTRACTThe CW CO2 laser annealing is an effective method for removing deep level defects induced by ion-implantation. The available laser density range is 350˜600 W/cm2, which is consistent with that needed to fully activate implanted impurities. At high power density (>600W/cm2 ) slip dislocations can be induced. The energy spectra of dislocations were measured with DLTS technique. One peak at Ev + 0.33eV in p-Si and two at peaks at Ec −0.37eV and Ec −0.50eV in n-Si have been found. These peaks are stable during thermal annealing at high temperature. But they can be passivated with hydrogen plasma annealing and reactivated by subsequent thermal annealing in vacuum. The dislocation core is reconstructed.

2002 ◽  
Vol 91 (3) ◽  
pp. 1520-1524 ◽  
Author(s):  
Ch. Schubert ◽  
U. Kaiser ◽  
A. Hedler ◽  
W. Wesch ◽  
T. Gorelik ◽  
...  

2021 ◽  
Vol 2103 (1) ◽  
pp. 012223
Author(s):  
M V Kozlova ◽  
A A Khomich ◽  
R A Khmelnitsky ◽  
A A Averin ◽  
A I Kovalev ◽  
...  

Abstract We report on the optical properties of He-related color centers created by He-ion implantation and subsequent thermal annealing in natural diamonds, including the temperature (300–700 K) and excitation power (1–1800 kW/cm2)-dependent photoluminescence (PL) measurements. The prospects for the use of He-implanted diamonds for temperature sensing are discussed. The effect of fast neutron irradiation on the optical properties of Si-V color centers in CVD diamonds were also examined.


2017 ◽  
Vol 50 (2) ◽  
pp. 539-546 ◽  
Author(s):  
Andrey Lomov ◽  
Kirill Shcherbachev ◽  
Yurii Chesnokov ◽  
Dmitry Kiselev

The structural changes in the surface layer of p-type Cz-Si(001) samples after high-dose low-energy (2 keV) He+plasma-immersion ion implantation and subsequent thermal annealing were studied using a set of complementary methods: high-resolution X-ray reflectometry, high-resolution X-ray diffraction, transmission electron microscopy and atomic force microscopy. The formation of a three-layer structure was observed (an amorphous a-SiOxlayer at the surface, an amorphous a-Si layer and a heavily damaged tensile-strained crystalline c-Si layer), which remained after annealing. Helium-filled bubbles were observed in the as-implanted sample. The influence of annealing on the evolution of the three-layer structure and the bubbles is considered. The bubbles are shown to grow after annealing. Their characteristic size is determined to be in the range of 5–20 nm. Large helium-filled bubbles are located in the amorphous a-Si layer. Small bubbles form inside the damaged crystalline Si layer. These bubbles are a major source of tensile strain in the c-Si layer.


2011 ◽  
Vol 257 (22) ◽  
pp. 9260-9263 ◽  
Author(s):  
Wenting Xu ◽  
Hailing Tu ◽  
Qinghua Xiao ◽  
Qing Chang ◽  
Zongfeng Li ◽  
...  

1981 ◽  
Vol 4 ◽  
Author(s):  
H. J. Stein ◽  
J. A. Knapp ◽  
P. S. Peercy

ABSTRACTAnnealing of divacancies which were produced by 11B ion implantation was investigated under furnace, pulsed e-beam and pulsed ruby laser exposures. Despite orders of magnitude shorter exposure times for annealing and the concomitant expected high levels of electronic excitation and layer stress, we find that the thermal annealing mechanism observed for furnace annealing is an adequate description for divacancy annealing under e-beam exposure. The observed need for melting to remove divacancies by Q-switched laser annealing is also consistent with predictions based upon extrapolations from furnace annealing.


2017 ◽  
Vol 3 (3) ◽  
pp. 104-109 ◽  
Author(s):  
Ksenia B. Eidelman ◽  
Nataliya Yu. Tabachkova ◽  
Kirill D. Shcherbachev ◽  
Yuri N. Parkhomenko ◽  
Vladimir V. Privesentsev ◽  
...  

Nanoscale ◽  
2018 ◽  
Vol 10 (9) ◽  
pp. 4228-4236 ◽  
Author(s):  
W. J. Nie ◽  
Y. X. Zhang ◽  
H. H. Yu ◽  
R. Li ◽  
R. Y. He ◽  
...  

We report on the synthesis of embedded gold (Au) nanoparticles (NPs) in Nd:YAG single crystals using ion implantation and subsequent thermal annealing.


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