Electrcn Trapping/Detrapping in Thin SiO2 Under High Fields
Keyword(s):
ABSTRACTA constant alternating current stressing technique is employed to study the electron trapping and detrapping cha~acteristics within a layer of thin silicon dioxide (˜.100 Å). A two-charge centroid model is proposed to explain the trapping/detrapping phenomena under high electric fields. The oxide breakdown mechanism induced by the local field of trapped electrons is also discussed.
Keyword(s):
2018 ◽
Vol 2018
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pp. 1-4
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2009 ◽
Vol 412
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pp. 33-38
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1986 ◽
Vol 44
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pp. 758-761