Pre-Gate Oxidation Cleaning of Silicon Wafer by Electric Arc Plasma Jet Treatment

1995 ◽  
Vol 386 ◽  
Author(s):  
G. Ya. Pavlov
Keyword(s):  
Plasma Jet ◽  
Constant Current ◽  
Plasma Cleaning ◽  
Arc Plasma ◽  
Chemical Cleaning ◽  
Wet Chemical ◽  
Constant Current Charge ◽  
Mos Structures ◽  
Electrophysical Parameters

ABSTRACTThe effect of arc plasma jet treatment (APJT) of silicon surface used for pre-gate oxidation cleaning on the electrophysical parameters of MOS structures (Si/SiO2/Si*/Al) has been studied- We show that APJT etching cleaning considerably improves the constant current charge to breakdown of MOS structures in comparison with conventional wet chemical cleaning. We have analyzed the effect of plasma cleaning conditions on the quality of gate oxide and SiO2/Si interface.

Effect of Electric ARC Plasma Jet Treatment on Mos Structure Reliability

1995 ◽  
Vol 391 ◽  
Author(s):  
V. M. Maslovsky ◽  
G. Ya. Pavlov
Keyword(s):  
Structural Changes ◽  
Plasma Jet ◽  
Electric Arc ◽  
Constant Current ◽  
Breakdown Field ◽  
Ir Absorption ◽  
Arc Plasma ◽  
Mos Structure ◽  
Structure Reliability ◽  
Constant Current Charge

AbstractThe effect of electric arc plasma jet treatment (APJT) on MOS structure reliability has been investigated. Si/SiO2/Si*/Al structures have been studied using the technique of constant current charge to breakdown before and after APJT. The study showed that APJT can improve MOS structure reliability: constant current charge to breakdown Qbd increased to more than 5 C·cm-2 and breakdown field Ebd increased to more than 20 MV/cm. This result was attributed to a structural modification of SiO2 and its interfaces as a result of APJT. Evidence for these structural changes is the appearance of additional SiO2 IR absorption peak which was observed by us.

Influence of Polysilicon Processing on the Quality of Thin RTP/Furnace Gate Oxides

1990 ◽  
Vol 182 ◽  
Author(s):  
J. Haase ◽  
R. Ferretti ◽  
S. Prasad
Keyword(s):  
Process Parameters ◽  
Thin Layers ◽  
Constant Current ◽  
Gate Oxides ◽  
Different Temperatures ◽  
Current Densities ◽  
Phosphorus Doped ◽  
Mos Structures

AbstractThin layers of oxides (10–11nm) were fabricated by rapid thermal (RTP) or furnace oxidation. The RTP oxides were grown at different temperatures and were exposed to a two step post oxidation anneal (POA). The furnace oxides were grown at one temperature and received different POA/s. As gate metallization, in-situ phosphorus-doped polysilicon was used. Post poly anneal (PPA) is carried out in the RTP system using a set of temperatures. After having defined MOS structures by photolithography oxide charges, breakdown voltages and breakdown charges were determined. For different current densities, FN-voltage shift during constant current injection was monitored to make lifetime predictions. Received data were correlated to the different process parameters.

Diamond Films Synthesis with a DC Arc Plasma Jet: Effect of Substrate Temperature on Quality of Diamond Films

2011 ◽  
Vol 175 ◽  
pp. 245-248
Author(s):  
Rong Fa Chen ◽  
Liang Gang Dai ◽  
Rui Zhu ◽  
Xian Liang Zhang ◽  
Tao Liu ◽  
...  
Keyword(s):  
Substrate Temperature ◽  
Diamond Film ◽  
Diamond Films ◽  
Plasma Jet ◽  
Sem Analysis ◽  
Arc Plasma ◽  
X Ray Diffraction ◽  
Dc Arc ◽  
Substrate Temperatures

. High quality diamond film wafers with different thickness are prepared by high power DC arc plasma jet CVD (DCPJ CVD) method using a CH4/Ar/H2 gas mixture. The effect of substrate temperature on the quality of diamond film was studied with theoretical analysis and experimental investigation. The results indicate that different structures in diamond film may grow with different substrate temperatures. The temperatures of 800°C, 900°C and 1000°C were tested in the experiments. The quality of diamond film showed the best at the temperature of 900°C. Characterization by X-ray diffraction, Raman spectroscopy and SEM analysis are also carried out.

Device Quality of Hydrogen Plasma Cleaning for Silicon Molecular Beam Epitaxy

1995 ◽  
Vol 386 ◽  
Author(s):  
W. Hansch ◽  
I. Eisele ◽  
H. Kibbel ◽  
U. KÖnig
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Hydrogen Plasma ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Plasma Cleaning ◽  
Chemical Cleaning ◽  
Cleaning Procedures ◽  
Desorption Step

ABSTRACTDifferent substrate cleaning procedures were used before fabrication of pin diodes by silicon molecular beam epitaxy (MBE). We investigated the quality of these diodes in order to demonstrate the superior quality of a low energy plasma cleaning in an ultra-high vacuum ( UHV). This plasma cleaning by hydrogen makes a wet-chemical cleaning or a high-temperature desorption step unnecessary. Moreover, the plasma-cleaned substrates are so strongly hydrogen passivated, that they can be transported through air and processed in another MBE chamber without any additional cleaning steps.

MOTION OF ANODE ATTACHMENT AND FLUCTUATIONS OF PLASMA JET IN DC ARC PLASMA TORCH

1997 ◽  
Vol 1 (2) ◽  
pp. 167-178 ◽  
Author(s):  
Milan Hrabovsky ◽  
M. Konrad ◽  
Vladimir Kopecky ◽  
J. Hlina ◽  
J. Benes ◽  
...  
Keyword(s):  
Plasma Torch ◽  
Plasma Jet ◽  
Arc Plasma ◽  
Arc Plasma Torch ◽  
Dc Arc ◽  
Dc Arc Plasma Torch

scholarly journals Plasma Cleaning Improves the Image Quality of Serial Block-face Scanning Electron Microscopy (SBFSEM) Volumetric Data Sets

2017 ◽  
Vol 23 (S1) ◽  
pp. 1266-1267 ◽  
Author(s):  
Barbara Armbruster ◽  
Christopher Booth ◽  
Stuart Searle ◽  
Michael Cable ◽  
Ronald Vane
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Image Quality ◽  
Data Sets ◽  
Plasma Cleaning ◽  
Volumetric Data ◽  
Face Scanning ◽  
Block Face ◽  
Scanning Electron

Capacity Fade Estimation of a Lithium-Ion Battery Through an Integrated Electrochemical Battery Model and Empirical Cycle Aging Model

2020 ◽  
Author(s):  
Sohel Anwar
Keyword(s):  
Electric Vehicle ◽  
Constant Current ◽  
Capacity Fade ◽  
State Of Health ◽  
Current Profile ◽  
Combined Model ◽  
Battery Model ◽  
Electric Vehicle Battery ◽  
Electrochemical Battery ◽  
Constant Current Charge

Abstract An electrochemical model based capacity fade estimation method for a Li-Ion battery is investigated in this paper. An empirical capacity fade model for estimating the state of health of a LiFePO4 electric vehicle battery was integrated with electrochemical battery model in Matlab/Simulink platform. This combined model was then validated against experimental data reported in the literature for constant current charge / discharge cycling. An HPPC current profile was then applied to the validated electrochemical-empirical battery prognosis model which reflected a real-time operating condition for charge and discharge current fluctuations in an electric vehicle battery. The combined model was simulated under the two different HPPC current inputs for three different cycle times. Additionally temperature was taken in account in estimating the cycle aging under the applied current profile to assess the present capacity remaining in the battery. The simulation results provided the state of health (SOH) of the battery for these cycling times which were comparable to the published experimental SOH values for constant current charge/discharge profiles. Thus this model can potentially be used to predict the capacity fade status of an electric vehicle battery.

Relationships between arc plasma jet properties and plasma/liquid interaction mechanisms for the deposition of nanostructured ceramic coatings

2021 ◽  
Author(s):  
Vincent Rat ◽  
Marguerite Bienia ◽  
Gayatri Dasharath Dhamale ◽  
Fabrice Mavier ◽  
Céline Ruelle ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Plasma Jet ◽  
Ceramic Coatings ◽  
Nanostructured Coatings ◽  
Arc Plasma ◽  
Pulsed Plasma ◽  
Plasma Properties ◽  
Interaction Mechanisms ◽  
Technical Requirements ◽  
Major Interest

Abstract Ceramic nanostructured coatings with intermediate thicknesses between 10 and 100 µm exhibit improved thermal and mechanical properties for thermal barrier coatings or wear resistant coatings. Such coatings comply with the technical requirements of aeronautical and automotive applications. This implies to develop deposition processes with high throughput and deposition rates promoting the formation of nanostructured coatings. The use of a liquid phase as a carrier medium of nanoparticles or of solution precursors has been shown to be of major interest when being injected within a thermal plasma jet. The as-sprayed materials can form ceramic nanostructured coatings provided the liquid injection encompassing the physicochemical properties of liquid and its injection method copes with the plasma properties. Especially the repeatability of the interaction phenomena between the liquid phase and the arc jet has a key role in the efficiency deposition so that some research efforts are devoted to stabilize the arc while a liquid jet is continuously injected within the plasma. Alternatively a pulsed arc plasma jet can be generated and associated with a time-phased injection of droplets. This paper presents the different issues related to the arc plasma properties produced by direct plasma torches including the arc instabilities and their influence on plasma/liquid interaction mechanisms leading to the formation of nanomaterials. A focus is made on pulsed plasma spraying associated with a synchronized injection of microsized droplets by means of an inkjet printing method.

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