Interaction of Atonic Hydrogen with Ion Bombardment Induced Defects at Si/SiO2 Interfaces
Keyword(s):
ABSTRACTElectrically active traps were induced in the Si-SiO2 interfacial region by silicon ion bombardment. A Kaufman source was used to introduce 400 eV hydrogen ions into the oxide and the interface. The interaction of the hydrogen species with the traps was monitored by a comprehensive set of electrical measurements of the metal-oxide-silicon [MOS] structures.
2004 ◽
Vol 19
(7)
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pp. 870-876
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Keyword(s):
1997 ◽
Vol 299
(1-2)
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pp. 183-189
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